Inventor
TOMOHIRO KOBAYASHI
Inventor
JP
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
C07CAcyclic or carbocyclic compounds8%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%
C07DHeterocyclic compounds6%
H02KDynamo-electric machines6%
C01BNon-metallic elements4%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution4%
B01FMixing, e.g. dissolving, emulsifying or dispersing2%
PatentTitleYear
12,416,794Optical system and imaging apparatus202512,413,114Vibration motor with housing having first and second notches for lead wire and flexible printed circuit board202512,249,887Vibrating motor with notch in case202512,072,627Resist composition and patterning process202412,052,819Printed wiring board and method for manufacturing printed wiring board202412,050,402Resist composition and patterning process202412,032,287Resist material and patterning process202411,994,798Resist material and patterning process202411,985,755Target structure and target device202411,876,429Vibration motor and haptic device202411,789,536Input device and display input system202311,762,287Onium salt compound, chemically amplified resist composition and patterning process202311,693,314Resist composition and patterning process202311,680,339Method of manufacturing group III nitride semiconductor substrate, group III nitride semiconductor substrate, and bulk crystal202311,662,663Substrate protective film-forming composition and pattern forming process202311,649,972Gas conditioner202311,592,287Method for measuring distance of diffusion of curing catalyst202311,448,962Resist composition and patterning process202211,327,400Patterning process202211,204,523Display device and surface light source202111,143,910Lighting device and display device2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021Patents assigned to FUNAI ELECTRIC CO (2)· patent assignee history
2021–2025Based in JP· patent location history
2022–2024Patents assigned to SHINETSU CHEMICAL CO (10)· patent assignee history
2023–2025Patents assigned to NIDEC CORP (4)· patent assignee history
2023Patents assigned to FURUKAWA CO LTD (1)· patent assignee history
2024Patents assigned to IBIDEN CO LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 10 | 2022–2024 |
| NIDEC CORP | 4 | 2023–2025 |
| FUNAI ELECTRIC CO | 2 | 2021 |
| FURUKAWA CO LTD | 1 | 2023 |
| IBIDEN CO LTD | 1 | 2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 21 | 2021–2025 |