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Inventor

TONY QUAN TRAN

Inventor
US

Overview

1→
Patents
2023
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing14%
B24DTools for grinding, buffing or sharpening14%
C09GPolishing compositions14%
C09KMaterials for miscellaneous applications, not provided for elsewhere14%
C23FNon-mechanical removal of metallic material from surface14%
H01LSemiconductor devices14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
PatentTitleYear
11,591,495Neutral to alkaline chemical mechanical polishing compositions and methods for tungsten2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023Patents assigned to ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC (1)· patent assignee history
2023Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC12023
Locations
LocationPatentsSpan
US12023