Inventor
Abraham SLACHTER
Inventor
NL
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
G06TImage data processing or generation, in general17%
G06FElectric digital data processing13%
G21KHandling of particles or ionising radiation not otherwise provided for13%
H01LSemiconductor devices13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
G05BControl or regulating systems in general4%
PatentTitleYear
12,386,268Method for calibrating simulation process based on defect-based process window202512,332,573Method for determining defectiveness of pattern based on after development image202512,197,136Method of determining control parameters of a device manufacturing process202512,044,980Method of manufacturing devices202411,822,255Process window based on defect probability202311,768,442Method of determining control parameters of a device manufacturing process202311,513,442Method of determining control parameters of a device manufacturing process2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to ASML NETHERLANDS BV (7)· patent assignee history
2022–2025Based in NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 7 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 7 | 2022–2025 |