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Inventor

Seishi Murakami

Inventor
Fuchu, JP

Overview

3→
Patents
1993–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
C30BSingle-crystal growth14%
H01JElectric discharge tubes or discharge lamps14%
H01LSemiconductor devices14%
PatentTitleYear
10,950,417Substrate processing apparatus and substrate loading mechanism20215,284,521'Vacuum film forming apparatus'19945,234,862'Thin film deposition method'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–1994Patents assigned to ANELVA CORP (2)· patent assignee history
1993–1994Patents assigned to NEC CORP (2)· patent assignee history
1993–1994Based in Fuchu, JP· patent location history
2021Patents assigned to TOKYO ELECTRON LTD (1)· patent assignee history
2021Based in Nirasaki, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ANELVA CORP21993–1994
NEC CORP21993–1994
TOKYO ELECTRON LTD12021
Locations
LocationPatentsSpan
Fuchu, JP21993–1994
Nirasaki, JP12021