Inventor
Ronny Soetarman
Inventor
Fremont, CA, US
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties22%
G01BMeasuring length, thickness or similar linear dimensions20%
G02BOptical elements, systems or apparatus18%
G06TImage data processing or generation, in general12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
G01RMeasuring electric variables4%
G11BInformation storage based on relative movement between record carrier and transducer4%
H01JElectric discharge tubes or discharge lamps4%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
G06FElectric digital data processing2%
PatentTitleYear
10,884,2283D microscope including insertable components to provide multiple imaging and measurement capabilities202110,769,769Dual mode inspector202010,475,173Dual mode inspector201910,359,613Optical measurement of step size and plated metal thickness201910,338,009Method and apparatus to detect defects in transparent solids201910,209,5013D microscope and methods of measuring patterned substrates201910,168,524Optical measurement of bump hieght201910,157,457Optical measurement of opening dimensions in a wafer201810,094,787Multi-surface specular reflection inspector201810,048,4803D microscope including insertable components to provide multiple imaging and measurement capabilities20189,921,169'Method of detecting defect location using multi-surface specular reflection'20189,784,691'Method and apparatus to optically detect defects in transparent solids'20179,389,408'3D microscope and methods of measuring patterned substrates'20169,036,869'Multi-surface optical 3D microscope'20158,976,366'System and method for monitoring LED chip surface roughening process'20157,630,086'Surface finish roughness measurement'20097,532,318'Wafer edge inspection'20097,397,621'Servo pattern characterization on magnetic disks'20087,161,669'Wafer edge inspection'20077,075,741'System and method for automatically determining magnetic eccentricity of a disk'20066,268,919'System and method for measuring thin film properties and analyzing two-dimensional histograms using and/not operations'20016,229,610'System and method for measuring thin film properties and analyzing two-dimensional histograms using substraction operation'20016,198,533'High temperature thin film property measurement system and method'20016,130,749'System and method for measuring thin film properties and analyzing two-dimensional histograms using a symmetry operation'20006,031,615'System and method for simultaneously measuring lubricant thickness and degradation, thin film thickness and wear, and surface roughness'20005,675,499'Optimal probe point placement'19975,530,372'Method of probing a net of an IC at an optimal probe-point'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–1997Based in San Jose, CA, US· patent location history
2000–2001Patents assigned to CANDELA INSTR (4)· patent assignee history
2000–2021Based in Fremont, CA, US· patent location history
2009–2021Patents assigned to KLA TENCOR CORP (10)· patent assignee history
2015–2020Patents assigned to ZETA INSTR INC (13)· patent assignee history
2015–2018Patents assigned to HOU ZHEN (4)· patent assignee history
2015–2018Patents assigned to KUDINAR RUSMIN (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZETA INSTR INC | 13 | 2015–2020 |
| KLA TENCOR CORP | 10 | 2009–2021 |
| CANDELA INSTR | 4 | 2000–2001 |
| HOU ZHEN | 4 | 2015–2018 |
| KUDINAR RUSMIN | 4 | 2015–2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fremont, California, US | 25 | 2000–2021 |
| San Jose, California, US | 2 | 1996–1997 |