LexDanaLexDanabeta
Inventor

Fumio Furusawa

Inventor
Ebina, JP

Overview

31→
Patents
1996–2020
Patent span
Physics
Primary field (CPC G)

Patents· 31 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Gprimary
G03GElectrography46%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1012%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds10%
C08LCompositions of macromolecular compounds10%
C07CAcyclic or carbocyclic compounds4%
H01LSemiconductor devices4%
H04NPictorial communication, e.g. television4%
B65HHandling thin or filamentary material, e.g. sheets, webs, cables2%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients2%
C09JAdhesives2%
PatentTitleYear
10,865,332Epoxy resin composition and electronic component device202010,662,315Epoxy resin molding material for sealing and electronic component device20208,921,762'Detection device having detachably attached plural units and image forming apparatus having the same'20148,854,708'Image sensing device for sensing an image on a recording medium'20148,810,833'Image processing device and image forming apparatus'20148,780,367'Detecting device, detecting method, and image forming apparatus'20148,699,891'Detection apparatus and image forming apparatus'20148,655,256'Recording material processing apparatus having a burr curing device'20148,626,004'Detecting apparatus and image forming apparatus'20148,587,846'Detection device and image forming device'20138,571,425'Detection device and image forming apparatus'20138,301,053'Image forming apparatus including main unit and process cartridge'20128,290,381'Image forming apparatus having stabilizing device'20127,672,627'Image forming apparatus'20107,397,139'Epoxy resin molding material for sealing use and semiconductor device'20086,713,589'Phenyl, naphthly or fluorene cyclopentyl epoxy resins'20046,329,492'Phenyl, naphthyl or fluorene cyclopentyl epoxy resins'20016,243,550'Compact image formation system having a plurality of paper trays'20016,207,789'Phenolic resin, resin composition, molding material for encapsulation, and electronic component device'20016,078,762'Image formation apparatus for document production or reproduction'20005,893,022'Image forming apparatus'19995,822,665'Image forming apparatus having means for preventing vibration of a transfer film caused from the operation of a separating device'19985,809,391'Image forming apparatus enabling easy and reliable recovery from a pop jam'19985,758,252'Image forming apparatus with improved transportation of curled sheets'19985,737,681'Image forming apparatus having curling device for holding transfer material and method of curling sheet'19985,659,863'Imaging forming apparatus with detecting capabilities of a condition of a transfer material carrier'19975,659,836'Transfer drum having a low-reflectivity area'19975,617,197'Image forming apparatus having a device for stripping a transfer member carried on a transfer drum'19975,608,504'Transfer material detecting device'19975,594,536'Reliable transfer film attachment structure'19975,576,819'Transfer element detect device'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–2014Patents assigned to FUJI XEROX CO LTD (25)· patent assignee history
1996–2012Based in Ebina, JP· patent location history
2001–2020Patents assigned to HITACHI CHEMICAL CO LTD (6)· patent assignee history
2001–2008Based in Yuki, JP· patent location history
2012–2014Patents assigned to FURUSAWA FUMIO (11)· patent assignee history
2012–2014Based in Kanagawa, JP· patent location history
2013–2014Patents assigned to ITO MASAO (7)· patent assignee history
2013–2014Patents assigned to MOROOKA JUNICHI (6)· patent assignee history
2020Based in Ibaraki, JP· patent location history
2020Based in Tsukuba, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
FUJI XEROX CO LTD251996–2014
FURUSAWA FUMIOself112012–2014
ITO MASAO72013–2014
HITACHI CHEMICAL CO LTD62001–2020
MOROOKA JUNICHI62013–2014
Locations
LocationPatentsSpan
Ebina, JP151996–2012
Kanagawa, JP82012–2014
Yuki, JP42001–2008
Ibaraki, JP12020
Tsukuba, JP12020