Inventor
Armin Schoeppach
Inventor
Aalen, DE
Overview
Patents· 30 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices42%
G02BOptical elements, systems or apparatus36%
Y10TTechnical subjects covered by former us classification6%
B23KSoldering or unsoldering3%
C03CChemical composition of glasses, glazes or vitreous enamels1%
C04BLime, magnesia1%
F16FSprings1%
F16HGearing1%
G01BMeasuring length, thickness or similar linear dimensions1%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them1%
PatentTitleYear
9,891,535'Optical projection system'20189,798,243'Optical device having a deformable optical element'20179,766,550'Actuators and microlithography projection exposure systems and methods using the same'20179,604,299'Method and device for connecting an optical element to a frame'20179,557,653'Optical projection system'20179,513,562'Projection exposure apparatus for microlithography for the production of semiconductor components'20169,436,101'Optical arrangement and microlithographic projection exposure apparatus including same'20169,341,807'Gravitation compensation for optical elements in projection exposure apparatuses'20169,217,936'Optical device having a deformable optical element'20159,195,145'Microlithographic imaging optical system including multiple mirrors'20159,175,948'Optical module with a measuring device'20159,104,016'Optical projection system'20158,885,143'Projection exposure apparatus for microlithography for the production of semiconductor components'20148,873,122'Microlithographic imaging optical system including multiple mirrors'20148,854,602'Holding device for an optical element in an objective'20148,854,603'Gravitation compensation for optical elements in projection exposure apparatuses'20148,705,185'Optical element'20148,705,006'Method and device for connecting an optical element to a frame'20148,659,745'Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations'20148,542,346'Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations'20138,508,868'Holding arrangement for an optical element'20138,456,615'Optical system having heat dissipation arrangement'20138,339,569'Temperature-control device for an optical assembly'20128,300,210'Optical projection system'20127,920,344'Arrangement for mounting an optical element'20117,729,065'Optical element unit'20107,564,636'Device for preventing the displacement of an optical element'20097,551,375'Process for connecting an optical element of a microlithographic projection exposure apparatus to a mount, and assembly'20097,239,462'Objective with at least one optical element'20077,079,331'Device for holding a beam splitter element'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2010Patents assigned to ZEISS CARL SMT AG (5)· patent assignee history
2006–2018Based in Aalen, DE· patent location history
2010Based in Wohnsitz, DE· patent location history
2011–2018Patents assigned to ZEISS CARL SMT GMBH (24)· patent assignee history
2012–2016Patents assigned to SCHOEPPACH ARMIN (13)· patent assignee history
2012–2014Patents assigned to GELLRICH BERNHARD (3)· patent assignee history
2012–2014Patents assigned to GEUPPERT BERNHARD (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT GMBH | 24 | 2011–2018 |
| SCHOEPPACH ARMINself | 13 | 2012–2016 |
| ZEISS CARL SMT AG | 5 | 2006–2010 |
| GELLRICH BERNHARD | 3 | 2012–2014 |
| GEUPPERT BERNHARD | 3 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Aalen, DE | 29 | 2006–2018 |
| Wohnsitz, DE | 1 | 2010 |