Inventor

Ichiro Hattori

Inventor

Yokohama, JP

Overview

1980–2000

Patent span

Physics

Primary field (CPC G)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B21Dprimary

B21DWorking or processing of sheet metal or metal tubes, rods or profiles without essentially removing material17%

C04BLime, magnesia17%

F27DDetails or accessories of furnaces, kilns, ovens or retorts, in so far as they are of kinds occurring in more than one kind of furnace17%

G01NInvestigating or analysing materials by determining their chemical or physical properties17%

G04GElectronic time-pieces17%

G10LSpeech analysis techniques or speech synthesis17%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1980Patents assigned to SEIKO INSTR & ELECTRONICS (1)· patent assignee history

1980Based in Tokyo, JP· patent location history

1991Patents assigned to SHINAGAWA REFRACTORIES CO (1)· patent assignee history

1991Based in Bizen, JP· patent location history

1998Patents assigned to FUJITSU LIMITED & ANIMO LIMITE (1)· patent assignee history

1998Based in Aichi, JP· patent location history

1998Based in Zushi, JP· patent location history

2000Patents assigned to ANIMO LIMITED (1)· patent assignee history

2000Patents assigned to FUJITSU LTD (1)· patent assignee history

2000Based in Yokohama, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ANIMO LIMITED	1	2000
FUJITSU LIMITED & ANIMO LIMITE	1	1998
FUJITSU LTD	1	2000
SEIKO INSTR & ELECTRONICS	1	1980
SHINAGAWA REFRACTORIES CO	1	1991

Locations