Inventor
Takahiko Wakatsuki
Inventor
Kanagawa, JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
B08BCleaning in general20%
B01DSeparation10%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices10%
H01LSemiconductor devices10%
H05BElectric heating10%
Y10TTechnical subjects covered by former us classification10%
Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2016Patents assigned to TOSHIBA KK (3)· patent assignee history
2012–2016Patents assigned to WAKATSUKI TAKAHIKO (3)· patent assignee history
2012–2013Patents assigned to FUJITA HIROSHI (2)· patent assignee history
2012–2013Patents assigned to HAYAMIZU NAOYA (2)· patent assignee history
2012–2013Patents assigned to HAYASHI TOSHIHIDE (2)· patent assignee history
2012–2013Based in Kanagawa, JP· patent location history
2016Based in Yokohama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSHIBA KK | 3 | 2012–2016 |
| WAKATSUKI TAKAHIKOself | 3 | 2012–2016 |
| FUJITA HIROSHI | 2 | 2012–2013 |
| HAYAMIZU NAOYA | 2 | 2012–2013 |
| HAYASHI TOSHIHIDE | 2 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 2 | 2012–2013 |
| Yokohama, JP | 1 | 2016 |