Inventor
ARIE JEFFREY DEN BOEF
Inventor
NL
Overview
Patents· 46 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices39%
G01NInvestigating or analysing materials by determining their chemical or physical properties20%
G01BMeasuring length, thickness or similar linear dimensions13%
G02BOptical elements, systems or apparatus6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
G06TImage data processing or generation, in general5%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein3%
G03HHolographic processes or apparatus2%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light1%
G06FElectric digital data processing1%
PatentTitleYear
12,591,179Metrology apparatus202612,566,406Dark field digital holographic microscope and associated metrology method202612,474,642Metrology method for measuring an etched trench and associated metrology apparatus202512,468,235Method and apparatus to determine a patterning process parameter202512,429,328Metrology method, target and substrate202512,411,421Metrology apparatus based on high harmonic generation and associated method202512,399,434Method of determining a characteristic of a structure, and metrology apparatus202512,393,046Metrology systems, coherence scrambler illumination sources and methods thereof202512,366,811Metrology system and method for determining a characteristic of one or more structures on a substrate202512,326,669Illumination apparatus and associated metrology and lithographic apparatuses202512,306,544Metrology tool with position control of projection system202512,235,096Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method202512,189,305Metrology method and apparatus and computer program202512,158,435Illumination and detection apparatus for a metrology apparatus202412,130,246Method for overlay metrology and apparatus thereof202412,086,973Detection apparatus for simultaneous acquisition of multiple diverse images of an object202412,067,340Computational wafer inspection202412,066,762On chip sensor for wafer overlay measurement202412,061,421Method and system for determining information about a target structure202412,013,647Metrology method202412,007,700Metrology system and method for determining a characteristic of one or more structures on a substrate202411,953,450Diffraction based overlay metrology tool and method of diffraction based overlay metrology202411,947,269Method and apparatus to determine a patterning process parameter202411,940,739Metrology apparatus202411,828,585Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method202311,822,254Metrology apparatus and a method of determining a characteristic of interest202311,815,675Metrology device and phase modulator apparatus therefor comprising a first moving grating and a first compensatory grating element202311,803,130Phase modulators in alignment to decrease mark size202311,703,772Recipe selection based on inter-recipe consistency202311,650,047Metrology apparatus and method for determining a characteristic of one or more structures on a substrate202311,644,428Diffraction based overlay metrology tool and method of diffraction based overlay metrology202311,640,116Metrology method, computer product and system202311,619,595Diffraction based overlay metrology tool and method of diffraction based overlay metrology202311,549,806Metrology apparatus202311,525,786Method and apparatus for angular-resolved spectroscopic lithography characterization202211,429,029Method and apparatus for illumination adjustment202211,428,521Metrology method, target and substrate202211,415,900Metrology system and method for determining a characteristic of one or more structures on a substrate202211,385,553Metrology method, patterning device, apparatus and computer program202211,333,985Position sensor202211,327,410Metrology apparatus and a method of determining a characteristic of interest202211,320,745Measuring a process parameter for a manufacturing process involving lithography202211,307,024Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method202211,262,661Metrology apparatus202211,204,239Metrology method, target and substrate202111,143,972Method and apparatus to determine a patterning process parameter2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to ASML NETHERLANDS BV (46)· patent assignee history
2021–2026Based in NL· patent location history
2023–2025Patents assigned to ASML HOLDING NV (4)· patent assignee history
2023Patents assigned to ASML NETHERLAND BV (1)· patent assignee history
2024Patents assigned to ASML HOLDING N V & ASML NETHERLANDS B V (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 46 | 2021–2026 |
| ASML HOLDING NV | 4 | 2023–2025 |
| ASML HOLDING N V & ASML NETHERLANDS B V | 1 | 2024 |
| ASML NETHERLAND BV | 1 | 2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 46 | 2021–2026 |