Inventor
Wolfgang R. Aderhold
Inventor
Cupertino, CA, US
Overview
Patents· 31 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H01LSemiconductor devices18%
C23CCoating metallic material9%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light9%
F27BFurnaces, kilns, ovens or retorts in general7%
H05BElectric heating5%
C30BSingle-crystal growth4%
F27DDetails or accessories of furnaces, kilns, ovens or retorts, in so far as they are of kinds occurring in more than one kind of furnace4%
G05DSystems for controlling or regulating non-electric variables3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
PatentTitleYear
10,948,353Thermal processing chamber with low temperature control202110,741,457System for non radial temperature control for rotating substrates202010,571,337Thermal cooling member with low temperature control202010,330,535Pyrometer background elimination20199,759,615'Pyrometer background elimination'20179,728,471'System for non radial temperature control for rotating substrates'20179,640,412'Apparatus and method for enhancing the cool down of radiatively heated substrates'20179,564,349'Rapid thermal processing chamber with micro-positioning system'20179,431,278'Backside rapid thermal processing of patterned wafers'20169,390,950'Rapid thermal processing chamber with micro-positioning system'20169,245,768'Method of improving substrate uniformity during rapid thermal processing'20169,018,110'Apparatus and methods for microwave processing of semiconductor substrates'20158,939,760'Spike anneal residence time reduction in rapid thermal processing chambers'20158,900,889'Rapid thermal processing chamber with micro-positioning system'20148,865,602'Edge ring lip'20148,724,977'System for non radial temperature control for rotating substrates'20148,658,945'Backside rapid thermal processing of patterned wafers'20148,314,371'Rapid thermal processing chamber with micro-positioning system'20128,249,436'System for non radial temperature control for rotating substrates'20128,109,669'Temperature uniformity measurement during thermal processing'20128,111,978'Rapid thermal processing chamber with shower head'20128,104,951'Temperature uniformity measurements during rapid thermal processing'20127,778,533'Semiconductor thermal process control'20107,667,162'Semiconductor thermal process control utilizing position oriented temperature generated thermal mask'20107,414,224'Backside rapid thermal processing of patterned wafers'20087,398,693'Adaptive control method for rapid thermal processing of a substrate'20087,195,934'Method and system for deposition tuning in an epitaxial film growth apparatus'20076,803,546'Thermally processing a substrate'20046,215,106'Thermally processing a substrate'20016,164,816'Tuning a substrate temperature measurement system'20005,343,293'Ellipsometer'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994Based in Nurnberg, DE· patent location history
2000–2021Patents assigned to APPLIED MATERIALS INC (30)· patent assignee history
2000–2021Based in Cupertino, CA, US· patent location history
2012–2017Patents assigned to ADERHOLD WOLFGANG (7)· patent assignee history
2012–2015Patents assigned to ADERHOLD WOLFGANG R (4)· patent assignee history
2012–2017Patents assigned to RANISH JOSEPH M (4)· patent assignee history
2012–2016Patents assigned to HUNTER AARON (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 30 | 2000–2021 |
| ADERHOLD WOLFGANGself | 7 | 2012–2017 |
| ADERHOLD WOLFGANG Rself | 4 | 2012–2015 |
| RANISH JOSEPH M | 4 | 2012–2017 |
| HUNTER AARON | 3 | 2012–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Cupertino, California, US | 30 | 2000–2021 |
| Nurnberg, DE | 1 | 1994 |