Inventor

Ryuji Aizawa

Inventor
Ibaraki, JP

Overview

10→
Patents
1991–2002
Patent span
Chemistry
Primary field (CPC C)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C10Mprimary
C10MLubricating compositions23%
C08JWorking-up14%
C10NIndexing scheme associated with subclass c10m relating to lubricating compositions14%
G02CSpectacles14%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds9%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
C08LCompositions of macromolecular compounds5%
H01BCables5%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy5%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991Patents assigned to NIKON CORP (3)· patent assignee history
1991Based in Tokyo, JP· patent location history
1991Based in Yoshimi, JP· patent location history
1994–2002Patents assigned to NIPPON CATALYTIC CHEM IND (7)· patent assignee history
1994–2002Based in Ibaraki, JP· patent location history
1994–1998Based in Tsukuba, JP· patent location history
1999–2001Based in Toride, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIPPON CATALYTIC CHEM IND71994–2002
NIKON CORP31991
Locations
LocationPatentsSpan
Ibaraki, JP31994–2002
Toride, JP21999–2001
Tsukuba, JP21994–1998
Tokyo, JP21991
Yoshimi, JP11991