Inventor
Richard A. Gontin
Inventor
Rye, NY, US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus38%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices31%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light15%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
G01SRadio direction-finding8%
PatentTitleYear
7,826,142'Method for improved optical design using deterministically defined surfaces'20107,411,687'Speckle reduction method and system for EUV interferometry'20087,164,534'Diffuser plate and method of making same'20077,027,164'Speckle reduction method and system for EUV interferometry'20067,002,747'Diffuser plate and method of making same'20065,844,685'Reference laser beam sampling apparatus'19984,785,169'Method of correcting errors in horizon sensors caused by radiance variations'1988Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988Patents assigned to BARNES ENG CO (1)· patent assignee history
1988–2010Based in Rye, NY, US· patent location history
1998Patents assigned to BAYER AG (1)· patent assignee history
2006–2010Patents assigned to ASML HOLDING NV (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML HOLDING NV | 5 | 2006–2010 |
| BARNES ENG CO | 1 | 1988 |
| BAYER AG | 1 | 1998 |
Locations
| Location | Patents | Span |
|---|---|---|
| Rye, New York, US | 7 | 1988–2010 |