Inventor

Joon-soo Park

Inventor
Seongnam-si, KR

Overview

22→
Patents
1999–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 22 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1032%
H10BElectronic memory devices13%
H10DInorganic electric semiconductor devices13%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
B65HHandling thin or filamentary material, e.g. sheets, webs, cables6%
H01LSemiconductor devices4%
H04NPictorial communication, e.g. television4%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them2%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2%
PatentTitleYear
10,553,438Semiconductor device and method for fabricating the same202010,276,373Method of manufacturing a semiconductor device20198,785,319'Methods for forming fine patterns of a semiconductor device'20148,614,148'Methods for forming fine patterns of a semiconductor device'20138,278,221'Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same'20128,062,981'Method of forming pattern using fine pitch hard mask'20118,034,684'Semiconductor device with improved overlay margin and method of manufacturing the same'20118,003,543'Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same'20117,879,726'Methods of forming semiconductor devices using selective etching of an active region through a hardmask'20117,842,601'Method of forming small pitch pattern using double spacers'20107,732,279'Semiconductor device with improved overlay margin and method of manufacturing the same'20107,732,341'Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same'20107,550,383'Methods of performing a photolithography process for forming asymmetric patterns and methods of forming a semiconductor device using the same'20097,518,704'Multiple exposure apparatus and multiple exposure method using the same'20097,473,647'Method of forming pattern using fine pitch hard mask'20097,463,333'Multi-exposure lithography system providing increased overlay accuracy'20087,414,279'Semiconductor device with improved overlay margin and method of manufacturing the same'20087,205,241'Method for manufacturing semiconductor device with contact body extended in direction of bit line'20076,960,414'Multi-exposure lithography method and system providing increased overlay accuracy'20056,716,746'Semiconductor device having self-aligned contact and method of fabricating the same'20046,522,351'Stereoscopic image display apparatus using a single projector'20035,867,320'Lens unit for projector'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2020Patents assigned to SAMSUNG ELECTRONICS CO LTD (22)· patent assignee history
1999–2003Based in Suwon-si, KR· patent location history
2004Based in Seoul, KR· patent location history
2005–2008Based in Gwacheon, KR· patent location history
2008–2020Based in Seongnam-si, KR· patent location history
2009–2011Based in Gyeonggi-do, KR· patent location history
2011–2012Patents assigned to LEE JI-YOUNG (2)· patent assignee history
2011–2012Patents assigned to PARK JOON-SOO (2)· patent assignee history
2012Patents assigned to CHO HAN-KU (1)· patent assignee history
2012Patents assigned to KOH CHA-WON (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAMSUNG ELECTRONICS CO LTD221999–2020
LEE JI-YOUNG22011–2012
PARK JOON-SOOself22011–2012
CHO HAN-KU12012
KOH CHA-WON12012
Locations
LocationPatentsSpan
Seongnam-si, KR142008–2020
Gwacheon, KR32005–2008
Gyeonggi-do, KR22009–2011
Suwon-si, KR21999–2003
Seoul, KR12004