Inventor

Osamu Fukuroi

Inventor
Tokyo, JP

Overview

18→
Patents
2000–2012
Patent span
Physics
Primary field (CPC G)

Patents· 18 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G11Bprimary
G11BInformation storage based on relative movement between record carrier and transducer33%
Y10TTechnical subjects covered by former us classification28%
B24BMachines, devices, or processes for grinding or polishing21%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
G01BMeasuring length, thickness or similar linear dimensions5%
B08BCleaning in general2%
G01RMeasuring electric variables2%
PatentTitleYear
8,146,237'Method of manufacturing a magnetic head'20127,748,395'Wash-target holder and method for washing wash-target using the same'20107,712,205'Method of manufacturing a magnetic head'20107,422,511'Element for detecting the amount of lapping having a resistive film electrically connected to the substrate'20087,392,580'Method for manufacturing a slider using electromagnetic wave'20087,359,152'Thin film magnetic head structure, method of manufacturing the same, and method of manufacturing thin film magnetic head'20087,281,317'Manufacturing method of flying magnetic head slider'20077,185,417'Method for shaping an air bearing surface of a magnetic head slider'20077,086,931'Magnetic head bar holding unit, lapping device, and method of lapping medium-opposing surface of thin-film magnetic head'20066,991,513'Magnetic head grinding device and method'20066,865,798'Method for shaping air bearing surface of magnetic head slider'20056,679,760'Lapping method of magnetic head slider and lapping method of bar'20046,623,330'Lapping sensor used in fabrication of magnetic head with magnetoresistive effect element and lapping control method using the sensor'20036,565,414'Polishing apparatus for magnetic head and method therefor'20036,452,750'Slider including a rail having a concave end and method of manufacturing same'20026,398,623'Processing method of device and processing method of slider'20026,399,148'Method of manufacturing lapping control sensor for magnetoresistive effect head'20026,083,081'Lapping control sensor for magnetoresistive effect head, lapping control method using the sensor and manufacturing method of the sensor'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2006Patents assigned to TDK CORP (6)· patent assignee history
2000–2006Based in Tokyo, JP· patent location history
2003–2012Patents assigned to SAE MAGNETICS HK LTD (12)· patent assignee history
2003–2010Based in Kwai Chung, HK· patent location history
2006–2008Based in Hong Kong, CN· patent location history
2008Based in Laguna, PH· patent location history
2010–2012Based in Shatin, HK· patent location history
2012Patents assigned to FUKUROI OSAMU (1)· patent assignee history
2012Patents assigned to ITO YOSHIAKI (1)· patent assignee history
2012Patents assigned to KODAKA KENJI (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAE MAGNETICS HK LTD122003–2012
TDK CORP62000–2006
FUKUROI OSAMUself12012
ITO YOSHIAKI12012
KODAKA KENJI12012
Locations
LocationPatentsSpan
Tokyo, JP62000–2006
Kwai Chung, HK52003–2010
Hong Kong, CN42006–2008
Shatin, HK22010–2012
Laguna, PH12008