Inventor
Robert D. Harned
Inventor
Redding, CT, US
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
G02BOptical elements, systems or apparatus23%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them10%
G01BMeasuring length, thickness or similar linear dimensions7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
Y10TTechnical subjects covered by former us classification7%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
G01MTesting static or dynamic balance of machines or structures3%
H04LTransmission of digital information, e.g. telegraphic communication3%
PatentTitleYear
11,082,304Methods, systems, and computer readable media for providing a multi-tenant software-defined wide area network (SD-WAN) node20218,168,017'Bonding silicon silicon carbide to glass ceramics'20127,826,142'Method for improved optical design using deterministically defined surfaces'20107,678,458'Bonding silicon silicon carbide to glass ceramics'20107,643,128'Large field of view projection optical system with aberration correctability'20107,443,514'Diffractive null corrector employing a spatial light modulator'20087,426,076'Projection system for a lithographic apparatus'20087,420,722'Multiple illumination source exposure apparatus'20087,405,802'Large field of view 2X magnification projection optical system for FPD manufacture'20087,342,701'Multiple illumination source exposure apparatus'20087,224,469'Optical system alignment system and method with high accuracy and simple operation'20077,184,124'Lithographic apparatus having an adjustable projection system and device manufacturing method'20077,158,215'Large field of view protection optical system with aberration correctability for flat panel displays'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2012Patents assigned to ASML HOLDING NV (12)· patent assignee history
2007–2012Based in Redding, CT, US· patent location history
2008–2010Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2012Patents assigned to HARNED ROBERT D (1)· patent assignee history
2012Patents assigned to LIPSON MATTHEW (1)· patent assignee history
2012Patents assigned to O'CONNOR GEOFFREY (1)· patent assignee history
2021Based in Cary, NC, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML HOLDING NV | 12 | 2007–2012 |
| ASML NETHERLANDS BV | 2 | 2008–2010 |
| HARNED ROBERT Dself | 1 | 2012 |
| LIPSON MATTHEW | 1 | 2012 |
| O'CONNOR GEOFFREY | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Redding, CT, US | 12 | 2007–2012 |
| Cary, NC, US | 1 | 2021 |