Inventor

Juergen Kleinschmidt

Inventor

Weissenfels, DE

Overview

2002–2019

Patent span

Electricity

Primary field (CPC H)

Patents· 54 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Sprimary

H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light26%

H05GX-ray technique18%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices16%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light6%

G02BOptical elements, systems or apparatus6%

A61KPreparations for medical, dental or toiletry purposes2%

A61PSpecific therapeutic activity of chemical compounds or medicinal preparations2%

B82YSpecific uses or applications of nanostructures2%

C07KPeptides2%

C12NMicroorganisms or enzymes2%

PatentTitleYear

10,344,057Assembly activating protein (AAP) and its use for the manufacture of parvovirus particles essentially consisting of VP32019 9,464,119'Assembly activating protein (AAP) and its use for the manufacture of parvovirus particles essentially consisting of VP3'2016 9,170,505'Arrangement for generating EUV radiation'2015 8,975,543'Electrical terminal module'2015 8,610,354'Method and apparatus for the generation of short-wavelength radiation by means of a gas discharge-based high-frequency, high-current discharge'2013 8,546,775'Method and arrangement for the stabilization of the source location of the generation of extreme ultraviolet (EUV) radiation based on a discharge plasma'2013 8,426,834'Method and apparatus for the generation of EUV radiation from a gas discharge plasma'2013 8,410,422'Method and arrangement for the adjustment of characteristics of a beam bundle of high-energy radiation emitted from a plasma'2013 7,974,321'Method and arrangement for stabilizing the average emitted radiation output of a pulsed radiation source'2011 D0626516'Adjusting device for the setpoint of an electric module'2010 7,800,086'Arrangement for radiation generation by means of a gas discharge'2010 7,755,070'Arrangement for the suppression of unwanted spectral components in a plasma-based EUV radiation source'2010 7,595,594'Arrangement for switching high electric currents by a gas discharge'2009 7,541,604'Arrangement for the generation of short-wavelength radiation based on a gas discharge plasma and method for the production of coolant-carrying electrode housings'2009 7,531,820'Arrangement and method for the generation of extreme ultraviolet radiation'2009 7,488,962'Arrangement for the generation of intensive short-wavelength radiation based on a gas discharge plasma'2009 7,476,884'Device and method for generating extreme ultraviolet (EUV) radiation'2009 7,414,253'EUV radiation source with high radiation output based on a gas discharge'2008 7,365,350'Method and arrangement for the suppression of debris in the generation of short-wavelength radiation based on a plasma'2008 7,266,137'Laser gas replenishment method'2007 7,079,224'Arrangement for debris reduction in a radiation source based on a plasma'2006 7,075,963'Tunable laser with stabilized grating'2006 7,072,370'Arrangement for generating pulsed currents with a high repetition rate and high current strength for gas discharge pumped radiation sources'2006 7,006,541'Absolute wavelength calibration of lithography laser using multiple element or tandem see through hollow cathode lamp'2006 6,965,624'Laser gas replenishment method'2005 6,946,669'Arrangement for the generation of EUV radiation with high repetition rates'2005 6,914,920'Method for energy stabilization of gas discharged pumped in selected impulse following driven beam sources'2005 6,894,298'Arrangement for generating extreme ultraviolet (EUV) radiation based on a gas discharge'2005 6,894,285'Arrangement for monitoring the energy radiated by an EUV radiation source'2005 6,865,212'Method for energy control of pulsed driven, gas discharged-coupled beam sources'2005 6,855,932'Detector arrangement for energy measurement of pulsed x-ray radiation'2005 6,856,638'Resonator arrangement for bandwidth control'2005 6,834,066'Stabilization technique for high repetition rate gas discharge lasers'2004 6,829,261'Method for the stabilization of the radiation output of a gas discharge-coupled radiation source in pulsed operation'2004 6,815,900'Radiation source with high average EUV radiation output'2004 6,801,561'Laser system and method for spectral narrowing through wavefront correction'2004 6,795,473'Narrow band excimer laser with a prism-grating as line-narrowing optical element'2004 6,792,023'Method and apparatus for reduction of spectral fluctuations'2004 6,747,741'Multiple-pass interferometric device'2004 6,721,345'Electrostatic precipitator corona discharge ignition voltage probe for gas status detection and control system for gas discharge lasers'2004 6,717,973'Wavelength and bandwidth monitor for excimer or molecular fluorine laser'2004 6,700,915'Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections'2004 6,700,916'E-diagnostic, laser simulator, automated testing and deconvolution of spectra for lithographic exposure radiation generating systems such as excimer or molecular fluorine laser or EUV source systems'2004 6,678,291'Molecular fluorine laser'2004 6,667,804'Temperature compensation method for wavemeters'2003 6,603,789'Narrow band excimer or molecular fluorine laser with improved beam parameters'2003 6,577,665'Molecular fluorine laser'2003 6,570,901'Excimer or molecular fluorine laser having lengthened electrodes'2003 6,567,451'Narrow band excimer or molecular fluorine laser having an output coupling interferometer'2003 6,563,853'Gas performance control system for gas discharge lasers'2003 6,553,050'Narrow band excimer or molecular fluorine laser having an output coupling interferometer'2003 6,516,012'Narrow band excimer or molecular fluorine laser having an output coupling interferometer'2003 6,476,987'Excimer laser with line narrowing'2002 6,421,365'Narrow band excimer or molecular fluorine laser having an output coupling interferometer'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2007Patents assigned to LAMBDA PHYSIK AG (25)· patent assignee history

2002–2007Based in Weissenfels, DE· patent location history

2004–2013Patents assigned to XTREME TECH GMBH (22)· patent assignee history

2006–2015Based in Goettingen, DE· patent location history

2010–2015Based in Detmold, DE· patent location history

2013–2016Patents assigned to KLEINSCHMIDT JUERGEN (7)· patent assignee history

2013Based in Jena, DE· patent location history

2016–2019Patents assigned to DEUTSCHES KREBSFORSCH (2)· patent assignee history

2016–2019Patents assigned to MEDIGENE AG (2)· patent assignee history

2016–2019Based in Bammental, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
LAMBDA PHYSIK AG	25	2002–2007
XTREME TECH GMBH	22	2004–2013
KLEINSCHMIDT JUERGENself	7	2013–2016
DEUTSCHES KREBSFORSCH	2	2016–2019
MEDIGENE AG	2	2016–2019

Locations

Location	Patents	Span
Weissenfels, DE	33	2002–2007
Goettingen, DE	12	2006–2015
Jena, DE	4	2013
Bammental, DE	2	2016–2019
Detmold, DE	2	2010–2015