Inventor
Ryoichi Nishida
Inventor
Ikoma, JP
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds15%
B82YSpecific uses or applications of nanostructures13%
C01BNon-metallic elements10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
Y10TTechnical subjects covered by former us classification8%
B82BNanostructures formed by manipulation of individual atoms, molecules, or limited collections of atoms or molecules as discrete units5%
C04BLime, magnesia5%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium5%
C25BElectrolytic or electrophoretic processes for the production of compounds or non-metals5%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution5%
PatentTitleYear
9,409,790'Titanium oxide structure and porous titanium oxide composition'20166,960,334'Amorphous nano-scale carbon tube and production method therefor'20056,916,434'Iron-carbon composite, carbonaceous material comprising said iron-carbon composite and process for preparing the same'20056,905,544'Manufacturing method for a carbon nanomaterial, a manufacturing apparatus for a carbon nanomaterial, and manufacturing facility for a carbon nanomaterial'20056,835,330'Iron-carbon composite, carbonaceous material comprising said iron-carbon composite and process for preparing the same'20046,255,430'Polysilanes and process for preparation of same'20016,174,982'Process for the preparation of polysilanes'20015,798,428'Method of preparing polysilanes and resultant products'19985,641,849'Method for producing polysilanes'19975,540,830'Method for producing disilanes'19965,416,182'Method for producing silicon network polymers'19955,120,406'Processes for preparation of polysilane'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992–2016Patents assigned to OSAKA GAS CO LTD (12)· patent assignee history
1992–2005Based in Ikoma, JP· patent location history
1998Based in Nara, JP· patent location history
2016Patents assigned to DEGUCHI TOMOE (1)· patent assignee history
2016Patents assigned to HAYAMA HIDEKAZU (1)· patent assignee history
2016Patents assigned to ICHIMURA NOBUKO (1)· patent assignee history
2016Patents assigned to MATSUYOSHI HIROAKI (1)· patent assignee history
2016Based in Osaka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| OSAKA GAS CO LTD | 12 | 1992–2016 |
| DEGUCHI TOMOE | 1 | 2016 |
| HAYAMA HIDEKAZU | 1 | 2016 |
| ICHIMURA NOBUKO | 1 | 2016 |
| MATSUYOSHI HIROAKI | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Ikoma, JP | 10 | 1992–2005 |
| Osaka, JP | 1 | 2016 |
| Nara, JP | 1 | 1998 |