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Inventor

Shu Jung Ma

Inventor
Kaohsiung, TW

Overview

5→
Patents
2002–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1050%
G01BMeasuring length, thickness or similar linear dimensions13%
H01JElectric discharge tubes or discharge lamps13%
H01LSemiconductor devices13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
PatentTitleYear
11,062,912Atomic layer etch process using plasma in conjunction with a rapid thermal activation process20216,979,897'Package substrate for improving electrical performance'20056,489,682'Ball grid array semiconductor package and substrate therefor'20026,448,639'Substrate having specific pad distribution'20026,403,896'Substrate having specific pad distribution'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2005Patents assigned to ADVANCED SEMICONDUCTOR ENG (4)· patent assignee history
2002–2005Based in Kaohsiung, TW· patent location history
2021Patents assigned to BEIJING E TOWN SEMICONDUCTOR TECH CO LTD (1)· patent assignee history
2021Patents assigned to MATTSON TECH INC (1)· patent assignee history
2021Based in Sunnyvale, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ADVANCED SEMICONDUCTOR ENG42002–2005
BEIJING E TOWN SEMICONDUCTOR TECH CO LTD12021
MATTSON TECH INC12021
Locations
LocationPatentsSpan
Kaohsiung, TW42002–2005
Sunnyvale, California, US12021