Inventor

Haruo Iwasawa

Inventor

Tokyo, JP

Overview

13→

Patents

2001–2010

Patent span

Chemistry

Primary field (CPC C)

Patents· 13 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests16%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds9%

C07CAcyclic or carbocyclic compounds7%

C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium7%

C09DCoating compositions, e.g. paints, varnishes or lacquers7%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%

C07DHeterocyclic compounds5%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%

C08LCompositions of macromolecular compounds5%

PatentTitleYear

7,718,228'Composition for forming silicon-cobalt film, silicon-cobalt film and method for forming same'2010 7,473,443'Composition for forming silicon film and method for forming silicon film'2009 7,288,359'Radiation-sensitive resin composition'2007 7,244,549'Pattern forming method and bilayer film'2007 7,223,802'High order silane composition, and method of forming silicon film using the composition'2007 7,108,955'Polysiloxane, process for production thereof and radiation-sensitive resin composition'2006 6,908,722'Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition'2005 6,846,895'Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition'2005 6,531,260'Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition'2003 6,403,280'Radiation sensitive resin composition'2002 6,322,949'Radiation sensitive resin composition'2001 6,187,504'Radiation sensitive resin composition'2001 6,180,316'Radiation sensitive resin composition'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2010Patents assigned to JSR CORP (13)· patent assignee history

2001–2007Based in Mie, JP· patent location history

2002–2010Based in Tokyo, JP· patent location history

2003Based in Asahi-machi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
JSR CORP	13	2001–2010

Locations

Location	Patents	Span
Tokyo, JP	7	2002–2010
Mie, JP	5	2001–2007
Asahi-machi, JP	1	2003