Inventor
Frank Seliger
Inventor
Dresden, DE
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices38%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1014%
G06FElectric digital data processing10%
H04LTransmission of digital information, e.g. telegraphic communication10%
G07CTime or attendance registers7%
B21CManufacture of metal sheets, wire, rods, tubes, profiles or like semi-manufactured products otherwise than by rolling3%
G06KGraphical data reading3%
G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes3%
G07FCoin-freed or like apparatus3%
H01LSemiconductor devices3%
PatentTitleYear
8,987,103'Multi-step deposition of a spacer material for reducing void formation in a dielectric material of a contact level of a semiconductor device'20158,932,930'Enhancing integrity of a high-K gate stack by protecting a liner at the gate bottom during gate head exposure'20158,765,559'Sophisticated gate electrode structures formed by cap layer removal with reduced loss of embedded strain-inducing semiconductor material'20148,765,542'Methods of forming a semiconductor device while preventing or reducing loss of active area and/or isolation regions'20148,561,446'Method and device for fabricating bonding wires on the basis of microelectronic manufacturing techniques'20138,560,857'Information processing apparatus, a server apparatus, a method of an information processing apparatus, a method of a server apparatus, and an apparatus executable program'20138,338,306'Forming semiconductor resistors in a semiconductor device comprising metal gates by increasing etch resistivity of the resistors'20128,338,284'Stress engineering in a contact level of semiconductor devices by stressed conductive layers and an isolation spacer'20128,329,549'Enhancing integrity of a high-k gate stack by protecting a liner at the gate bottom during gate head exposure'20128,329,526'Cap removal in a high-k metal gate electrode structure by using a sacrificial fill material'20128,258,062'Cap layer removal in a high-K metal gate stack by using an etch process'20128,171,295'Information processing apparatus, a server apparatus, a method of an information processing apparatus, a method of a server apparatus, and an apparatus executable process'20127,981,740'Enhanced cap layer integrity in a high-K metal gate stack by using a hard mask for offset spacer patterning'20117,951,677'Corner rounding in a replacement gate approach based on a sacrificial fill material applied prior to work function metal deposition'20117,757,950'Election system enabling coercion-free remote voting'20107,564,977'System, method and program product for anonymous transfer of messages'20097,490,768'Election system enabling coercion-free remote voting'20097,375,032'Semiconductor substrate thinning method for manufacturing thinned die'20086,892,301'Method and system for securely handling information between two information processing devices'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2013Patents assigned to IBM (6)· patent assignee history
2005–2009Based in Hildrizhausen, DE· patent location history
2008–2015Patents assigned to ADVANCED MICRO DEVICES INC (3)· patent assignee history
2008Based in Zeitz, DE· patent location history
2009–2013Based in Altdorf, DE· patent location history
2011–2015Patents assigned to GLOBALFOUNDRIES INC (10)· patent assignee history
2011–2015Based in Dresden, DE· patent location history
2012–2015Patents assigned to SELIGER FRANK (10)· patent assignee history
2012–2015Patents assigned to LENSKI MARKUS (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| GLOBALFOUNDRIES INC | 10 | 2011–2015 |
| SELIGER FRANKself | 10 | 2012–2015 |
| IBM | 6 | 2005–2013 |
| ADVANCED MICRO DEVICES INC | 3 | 2008–2015 |
| LENSKI MARKUS | 3 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Dresden, DE | 12 | 2011–2015 |
| Altdorf, DE | 4 | 2009–2013 |
| Hildrizhausen, DE | 2 | 2005–2009 |
| Zeitz, DE | 1 | 2008 |