LexDanaLexDanabeta
Inventor

HYUNWOO YU

Inventor
KR

Overview

4→
Patents
2022–2026
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices36%
G06FElectric digital data processing18%
G06NComputing arrangements based on specific computational models18%
G05BControl or regulating systems in general9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
Y02PClimate change mitigation technologies in the production or processing of goods9%
PatentTitleYear
12,578,653Method for determining a sampling scheme, a semiconductor substrate measurement apparatus, a lithographic apparatus202612,189,302Computational metrology202512,044,981Method and apparatus for optimization of lithographic process202411,347,150Computational metrology2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2026Patents assigned to ASML NETHERLANDS BV (4)· patent assignee history
2022–2025Based in KR· patent location history
2026Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV42022–2026
Locations
LocationPatentsSpan
KR32022–2025
NL12026