LexDanaLexDanabeta
Inventor

Kevin Barry Ray

Inventor
Fort Collins, CO, US

Overview

98→
Patents
1997–2020
Patent span
Performing operations
Primary field (CPC B)

Patents· 98 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B41Cprimary
B41CProcesses for the manufacture or reproduction of printing surfaces31%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
B41MPrinting, duplicating, marking, or copying processes11%
B41NPrinting plates or foils7%
H05KPrinted circuits5%
Y10TTechnical subjects covered by former us classification3%
B41FPrinting machines or presses2%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds1%
C09DCoating compositions, e.g. paints, varnishes or lacquers1%
PatentTitleYear
10,752,037Lithographic imaging and printing without defects of electrostatic origin202010,302,396Method of and device for improving marksmanship skill201910,124,571Ablation-type lithographic printing members having improved exposure sensitivity and related methods201810,011,137Dry lithographic imaging and printing with printing members having aluminum substrates20189,827,759Dry printing with simplified plate cleaning20179,605,150'Recording media and related methods'20179,555,615'Ablation-type lithographic imaging with silicone acrylate layers'20179,387,659'Ablation-type lithographic printing members having improved exposure sensitivity and related methods'20169,387,660'Ablation-type lithographic printing members having improved shelf life and related methods'2016D0749598'Monitor-mountable computing device'2016D0728029'Remote control for on-line gaming'20158,967,043'Ablation-type lithographic printing members having improved exposure sensitivity and related methods'20158,936,902'Positive-working imageable elements and method of use'20158,875,629'Ablation-type lithographic imaging with enhanced debris removal'20148,685,623'Lithographic imaging and printing without defects of electrostatic origin'20148,652,758'Lithographic imaging and printing with printing members having fusible polymeric particles'20148,512,481'Press cleaning with low-VOC solvent compositions'20138,323,874'Method of making lithographic printing plates'20128,240,943'On-press developable imageable elements'20127,781,143'Negative-working imageable elements and methods of use'20107,763,413'Methods for imaging and processing negative-working imageable elements'20107,659,046'Water-developable infrared-sensitive printing plate'20107,592,128'On-press developable negative-working imageable elements'20097,452,638'Negative-working radiation-sensitive compositions and imageable materials'20087,338,745'Multilayer imageable element with improved chemical resistance'20087,326,521'Method of imaging and developing negative-working elements'20087,291,440'Bakeable multi-layer imageable element'20077,273,689'Method to remove unwanted, unexposed, positive-working, IR radiation sensitive layer'20077,247,418'Imageable members with improved chemical resistance'20077,223,506'Imageable members with improved chemical resistance'20077,217,502'Nanopastes for use as patterning compositions'20077,186,482'Multilayer imageable elements'20077,175,967'Heat treatment of multilayer imageable elements'20077,175,969'Method of preparing negative-working radiation-sensitive elements'20077,172,850'Preparation of solvent-resistant binder for an imageable element'20077,163,777'Thermally sensitive imageable element'20077,160,653'Multilayer imageable element containing epoxy resin'20077,144,661'Multilayer imageable element with improved chemical resistance'20067,094,503'Nanopastes for use as patterning compositions'20067,081,322'Nanopastes as ink-jet compositions for printing plates'20067,070,902'Imageable elements containing cyanoacrylate polymer particles'20067,060,416'Positive-working, thermally sensitive imageable element'20067,060,415'Printing plate precursor comprising solvent-resistant copolymer'20067,056,643'Preparation of a printing plate using ink-jet'20067,049,045'Multilayer imageable elements'20067,049,047'Imageable element with masking layer comprising sulfated polymer'20067,029,805'Imageable element with masking layer comprising betaine-containing co-polymers'20067,026,254'Manufacture of masks and electronic parts'20066,992,688'Method for developing multilayer imageable elements'20066,981,446'Ink-jet imaging method'20066,969,579'Solvent resistant imageable element'20056,942,957'Ionic liquids as developability enhancing agents in multilayer imageable elements'20056,939,663'Sulfated phenolic resins and printing plate precursors comprising sulfated phenolic resins'20056,921,626'Nanopastes as patterning compositions for electronic parts'20056,908,726'Thermally imageable elements imageable at several wavelengths'20056,905,812'Lithographic printing form and method of preparation and use thereof'20056,902,861'Infrared absorbing compounds and their use in photoimageable elements'20056,893,796'Flexographic element having an integral thermally bleachable mask layer'20056,893,783'Multilayer imageable elements'20056,887,642'Multi-layer negative working imageable element'20056,858,359'Thermally sensitive, multilayer imageable element'20056,849,372'Method of manufacturing imaging compositions'20056,843,176'Method to remove unwanted, unexposed, radiation-sensitive layer in a lithographic printing plate'20056,803,167'Preparation of lithographic printing plates'20046,800,426'Process for making a two layer thermal negative plate'20046,794,107'Thermal generation of a mask for flexography'20046,777,164'Lithographic printing forms'20046,764,807'Planographic printing'20046,732,653'Method to remove unwanted, unexposed, positive-working, radiation-sensitive layer'20046,723,495'Water-developable negative-working ultraviolet and infrared imageable element'20046,723,490'Minimization of ablation in thermally imageable elements'20046,673,514'Imagable articles and compositions, and their use'20046,623,905'Pattern formation'20036,596,469'Method of making masks and electronic parts'20036,562,527'Imaged members and method of preparation thereof'20036,558,869'Pattern formation'20036,558,872'Relation to the manufacture of masks and electronic parts'20036,558,787'Relation to manufacture of masks and electronic parts'20036,551,763'Method for manufacture of electronic parts'20036,537,735'Pattern-forming methods and radiation sensitive materials'20036,524,767'Use of metal compounds in imagable articles'20036,461,795'Manufacture of lithographic printing forms'20026,451,502'manufacture of electronic parts'20026,423,456'Method for manufacture of electronic parts'20026,416,932'Waterless lithographic plate'20026,399,271'Planographic printing'20026,352,814'Method of forming a desired pattern'20026,291,134'Lithographic plate precursor'20016,265,136'Lithographic plate precursor'20016,248,505'Method for producing a predetermined resist pattern'20016,245,477'Imagable compositions and printing forms'20016,242,159'Method of preparing a water-less lithographic printing form'20016,238,843'Planographic printing member and method for its preparation'20016,218,083'Pattern-forming methods'20016,138,567'Method of preparing a planographic printing member with a radiation sensitive member'20006,138,568'Planographic printing member and process for its manufacture'20006,058,841'Planographic printing'20005,615,037'Sub-octave bandpass optical remote antenna link modulator and method therefor'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2006Patents assigned to KODAK POLYCHROME GRAPHICS LLC (44)· patent assignee history
2000–2006Based in Leeds, GB· patent location history
2001–2004Based in Morley, GB· patent location history
2002–2005Based in Castleford, GB· patent location history
2003–2012Based in Fort Collins, CO, US· patent location history
2005–2015Patents assigned to EASTMAN KODAK CO (31)· patent assignee history
2013–2018Patents assigned to RAY KEVIN (14)· patent assignee history
2013–2017Patents assigned to RONDON SONIA (8)· patent assignee history
2013–2020Based in Windham, NH, US· patent location history
2016–2020Patents assigned to PRESSTEK LLC (8)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KODAK POLYCHROME GRAPHICS LLC442000–2006
EASTMAN KODAK CO312005–2015
RAY KEVINself142013–2018
PRESSTEK LLC82016–2020
RONDON SONIA82013–2017
Locations
LocationPatentsSpan
Fort Collins, CO, US542003–2012
Windham, NH, US132013–2020
Leeds, GB102000–2006
Morley, GB82001–2004
Castleford, GB62002–2005