Inventor
Yoshitsugu Abe
Inventor
Anjo, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests23%
G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure15%
H10DInorganic electric semiconductor devices15%
B81BMicrostructural devices or systems, e.g. micromechanical devices8%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems8%
H04LTransmission of digital information, e.g. telegraphic communication8%
PatentTitleYear
6,284,670'Method of etching silicon wafer and silicon wafer'20016,194,236'Electrochemical etching method for silicon substrate having PN junction'20015,972,236'Etchant, etching method using the same, and related etching apparatus'19995,949,118'Etching method for silicon substrates and semiconductor sensor'19995,912,903'Method and system for quickly transferring data in a network having computers connected therewith'19995,899,750'Fine processing method'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2001Patents assigned to DENSO CORP (4)· patent assignee history
1999Patents assigned to HITACHI LTD (1)· patent assignee history
1999Patents assigned to NIPPON DENSO CO (1)· patent assignee history
1999–2001Based in Anjo, JP· patent location history
1999Based in Hadano, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| DENSO CORP | 4 | 1999–2001 |
| HITACHI LTD | 1 | 1999 |
| NIPPON DENSO CO | 1 | 1999 |
Locations
| Location | Patents | Span |
|---|---|---|
| Anjo, JP | 5 | 1999–2001 |
| Hadano, JP | 1 | 1999 |