Inventor

Hermanus L. Peek

Inventor
Eindhoven, NL

Overview

20→
Patents
1978–2018
Patent span
Electricity
Primary field (CPC H)

Patents· 20 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices29%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests21%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation17%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1015%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
G06KGraphical data reading4%
H01LSemiconductor devices2%
H04NPictorial communication, e.g. television2%
PatentTitleYear
10,128,190Semiconductor device and method of manufacturing such semiconductor device20187,525,330'Semiconductor device, card, system, and methods of initializing and checking the authenticity and the identity of the semiconductor device'20097,309,907'Semiconductor device card methods of initializing checking the authenticity and the identity thereof'20076,597,024'Charge-coupled image sensor comprising gate electrodes interconnected by shunt electrodes'20036,500,691'Image sensor and method of manufacturing same'20026,448,592'Charge coupled device, and method of manufacturing such a device'20026,054,336'Method of manufacturing an electronic device'20005,541,133'Method of manufacturing insulated electrodes in a semiconductor device and semiconductor device manufactured by such a method'19965,536,678'Method of manufacturing a wiring arrangement for a semiconductor device using insulating and etch stop layers'19965,517,244'Charge-coupled imaging device camera provided with such an imaging device'19965,449,931'Charge coupled imaging device having multilayer gate electrode wiring'19955,396,092'Wiring arrangement for a semiconductor device using insulating and etch stop layers'19955,306,390'Method of manufacturing a semiconductor device using an implantation mask'19944,877,754'Method of manufacturing semiconductor device'19894,763,185'Semiconductor device and method of manufacturing same'19884,756,793'Method of manufacturing a semiconductor device'19884,700,459'Method of manufacturing a semiconductor device with overlapping strip electrodes'19874,332,078'Method of manufacturing a semiconductor device'19824,301,191'Method of providing a conductor layer pattern having parts which are present at a small separation in the manufacture of semiconductor devices'19814,077,112'Method of manufacturing charge transfer device'1978

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1978–2000Patents assigned to PHILIPS CORP (14)· patent assignee history
1978–2009Based in Eindhoven, NL· patent location history
2002–2003Patents assigned to DALSA CORP (2)· patent assignee history
2002Patents assigned to KONINKL PHILIPS ELECTRONICS NV (1)· patent assignee history
2007–2009Patents assigned to NXP BV (2)· patent assignee history
2018Patents assigned to KLAASSENS WILCO (1)· patent assignee history
2018Based in Geldrop, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
PHILIPS CORP141978–2000
DALSA CORP22002–2003
NXP BV22007–2009
KLAASSENS WILCO12018
KONINKL PHILIPS ELECTRONICS NV12002
Locations
LocationPatentsSpan
Eindhoven, NL191978–2009
Geldrop, NL12018