Inventor
David W. Myers
Inventor
Poway, CA, US
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light17%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light17%
H05GX-ray technique10%
H01JElectric discharge tubes or discharge lamps9%
B82YSpecific uses or applications of nanostructures7%
G01NInvestigating or analysing materials by determining their chemical or physical properties5%
G21KHandling of particles or ionising radiation not otherwise provided for5%
G01BMeasuring length, thickness or similar linear dimensions2%
G02BOptical elements, systems or apparatus2%
PatentTitleYear
9,239,268'Calibration of photoelectromagnetic sensor in a laser source'20169,239,269'Calibration of photoelectromagnetic sensor in a laser source'20167,567,607'Very narrow band, two chamber, high rep-rate gas discharge laser system'20097,323,703'EUV light source'20087,317,196'LPP EUV light source'20087,218,661'Line selected F2 two chamber laser system'20077,164,144'EUV light source'20077,141,806'EUV light source collector erosion mitigation'20067,061,961'Very narrow band, two chamber, high rep-rate gas discharge laser system'20067,058,107'Line selected F2 two chamber laser system'20066,801,560'Line selected F2 two chamber laser system'20046,625,191'Very narrow band, two chamber, high rep rate gas discharge laser system'20036,567,450'Very narrow band, two chamber, high rep rate gas discharge laser system'20036,128,323'Reliable modular production quality narrow-band high REP rate excimer laser'20005,525,799'Portable gas chromatograph-mass spectrometer'19965,153,433'Portable mass spectrometer with one or more mechanically adjustable electrostatic sectors and a mechanically adjustable magnetic sector all mounted in a vacuum chamber'19924,909,631'Method for film thickness and refractive index determination'19904,874,240'Characterization of semiconductor resist material during processing'19894,857,738'Absorption measurements of materials'1989D0246541'Golf club head'1977Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1977–1990Patents assigned to MYERS DAVID W (2)· patent assignee history
1977Based in Minneapolis, MN, US· patent location history
1989Patents assigned to GEN SIGNAL CORP (1)· patent assignee history
1989Patents assigned to HOECHST CELANESE (1)· patent assignee history
1989–1996Based in Livermore, CA, US· patent location history
2000–2009Patents assigned to CYMER INC (12)· patent assignee history
2000–2016Based in Poway, CA, US· patent location history
2016Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CYMER INC | 12 | 2000–2009 |
| ASML NETHERLANDS BV | 2 | 2016 |
| MYERS DAVID Wself | 2 | 1977–1990 |
| GEN SIGNAL CORP | 1 | 1989 |
| HOECHST CELANESE | 1 | 1989 |
Locations
| Location | Patents | Span |
|---|---|---|
| Poway, California, US | 14 | 2000–2016 |
| Livermore, California, US | 5 | 1989–1996 |
| Minneapolis, Minnesota, US | 1 | 1977 |