Inventor
Gaston J. Benoy
Inventor
Edegem, BE
Overview
Patents· 2 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C07Dprimary
C07DHeterocyclic compounds40%
G03CPhotosensitive materials for photographic purposes40%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1977–1978Patents assigned to AGFA GEVAERT NV (2)· patent assignee history
1977–1978Based in Edegem, BE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AGFA GEVAERT NV | 2 | 1977–1978 |
Locations
| Location | Patents | Span |
|---|---|---|
| Edegem, BE | 2 | 1977–1978 |