Inventor
Sheng-Chang HSU
Inventor
TW
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
G01NInvestigating or analysing materials by determining their chemical or physical properties17%
G01BMeasuring length, thickness or similar linear dimensions8%
G01RMeasuring electric variables8%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein8%
G06TImage data processing or generation, in general8%
PatentTitleYear
12,282,260Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomask202511,953,448Method for defect inspection202411,567,400Method of fabricating a photomask and method of inspecting a photomask202311,209,736Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomask2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (4)· patent assignee history
2021–2025Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 4 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 4 | 2021–2025 |