Inventor
Hiroyuki Saitoh
Inventor
Kanagawa, JP
Overview
Patents· 34 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H04Nprimary
H04NPictorial communication, e.g. television20%
C08LCompositions of macromolecular compounds6%
G06FElectric digital data processing6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
B24BMachines, devices, or processes for grinding or polishing5%
G03GElectrography5%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%
B08BCleaning in general3%
C02FTreatment of water, waste water, sewage, or sludge3%
PatentTitleYear
9,636,840'Chain saw'20178,061,044'Power tool with chips ejecting mechanism'20117,364,176'Vehicular anti-vibration structure'20087,353,366'Processing device'20087,294,198'Process for producing single-crystal gallium nitride'20076,038,486'Control method for factory automation system'20005,962,139'Semiconductor sealant of epoxy resin and organic polymer-grafted silicone polymer'19995,805,883'Interrupt process distributing system'19985,795,401'Method for scrubbing substrate'19985,739,217'Epoxy resin molding for sealing electronic parts containing organic polymer-grafted silicone'19985,634,038'Common memory protection system in a multiprocessor configuration using semaphore-flags stored at complementary addresses for enabling access to the memory'19975,594,865'Watchdog timer that can detect processor runaway while processor is accessing storage unit using data comparing unit to reset timer'19975,530,769'Equalizer and audio device using the same'19965,510,446'Method of preparing naphthol-modified phenolic resin and epoxy resin molding material for sealing electronic parts'19965,465,447'Apparatus for scrubbing substrate'19955,459,223'Method of preparing naphthol-modified phenolic resin'19955,393,724'Process for removing oxidizable substance or reducible substance, composite containing metal oxide or hydroxide, and process for production thereof'19954,965,016'Granular calcuim hypochlorite composition and process for preparation thereof'19904,893,916'Automatically stored vehicle mirror'19904,709,149'Copying machine'19874,661,703'Two-color copying machine'19874,652,913'Method and apparatus for reading color images using a plurality of color light sources in which one of the light sources is turned on continuously'19874,638,372'Color copier'19874,636,081'Apparatus for reading color image'19874,633,314'Shading correction device'19864,633,301'Method and apparatus with white balancing correction for separating a color signal and its complement'19864,626,922'Picture signal discriminating circuit'19864,598,999'Area detection method of an original for use in copying machines'19864,554,583'Shading correction device'19854,518,988'Two-color copying machine'19854,518,987'Three-color copying machine'19854,518,999'Picture image position setting apparatus'19854,514,744'Electrostatic copying device employing thermally fluidizable medium on photosensitive belt'19854,505,574'Copying machine'1985Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1985–1987Patents assigned to FUJI XEROX CO LTD (15)· patent assignee history
1985–1987Based in Kanagawa, JP· patent location history
1986–1987Based in Ebina, JP· patent location history
1995–1999Patents assigned to HITACHI CHEMICAL CO LTD (4)· patent assignee history
1995–1998Patents assigned to SETEK M KK (2)· patent assignee history
1995–2000Based in Tokyo, JP· patent location history
1997–2008Patents assigned to FUJITSU LTD (4)· patent assignee history
1997–2008Based in Kawasaki, JP· patent location history
1998–1999Based in Tsukuba, JP· patent location history
2011–2017Patents assigned to HITACHI KOKI KK (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJI XEROX CO LTD | 15 | 1985–1987 |
| FUJITSU LTD | 4 | 1997–2008 |
| HITACHI CHEMICAL CO LTD | 4 | 1995–1999 |
| HITACHI KOKI KK | 2 | 2011–2017 |
| SETEK M KK | 2 | 1995–1998 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 9 | 1985–1987 |
| Ebina, JP | 6 | 1986–1987 |
| Kawasaki, JP | 3 | 1997–2008 |
| Tokyo, JP | 3 | 1995–2000 |
| Tsukuba, JP | 2 | 1998–1999 |