Inventor
Shinji Tarutani
Inventor
Shizuoka, JP
Overview
Patents· 33 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices35%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds10%
Y10TTechnical subjects covered by former us classification10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
B82YSpecific uses or applications of nanostructures3%
B01DSeparation2%
C08LCompositions of macromolecular compounds2%
C09DCoating compositions, e.g. paints, varnishes or lacquers2%
G11BInformation storage based on relative movement between record carrier and transducer2%
PatentTitleYear
10,126,653Pattern forming method and resist composition20189,897,922'Method of forming pattern and developer for use in the method'20189,709,892'Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same'20179,663,671'Curable composition for imprints and method of storing the same'20179,551,935'Pattern forming method and resist composition'20179,507,263'Underlay film composition for imprints and method of forming pattern and pattern formation method using the same'20169,482,958'Method of forming pattern and developer for use in the method'20169,223,219'Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film'20159,116,437'Pattern forming method, chemical amplification resist composition and resist film'20159,097,973'Method of forming pattern and developer for use in the method'20158,999,621'Pattern forming method, chemical amplification resist composition and resist film'20158,933,144'Curable composition for imprint, pattern-forming method and pattern'20158,911,930'Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and pattern'20148,877,828'Method for producing curable composition for imprints'20148,871,642'Method of forming pattern and developer for use in the method'20148,820,541'Method for producing curable composition for imprints'20148,808,965'Pattern forming method, pattern, chemical amplification resist composition and resist film'20148,753,802'Pattern forming method, chemical amplification resist composition and resist film'20148,709,704'Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method'20148,647,812'Pattern forming method, chemical amplification resist composition and resist film'20148,632,938'Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition'20148,603,733'Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method'20138,241,840'Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method'20128,088,550'Positive resist composition and pattern forming method'20128,034,547'Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method'20118,017,304'Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method'20117,635,553'Pattern forming method and resist composition used therefor'20097,425,404'Chemical amplification resist composition and pattern-forming method using the same'20087,338,744'Positive resist composition and pattern forming method using the same'20087,294,450'Chemical amplification-type resist composition and production process thereof'20076,755,579'Developer having substrate oscillating system and method of developing process'20045,615,202'Automatic disc changer for a disc reproducing system'19975,550,801'Linear arrayed disc changer with shiftable guide projections'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–1997Based in Saitama, JP· patent location history
2004Based in Tokyo, JP· patent location history
2007–2018Patents assigned to FUJIFILM CORP (30)· patent assignee history
2007–2018Based in Shizuoka, JP· patent location history
2012–2018Patents assigned to TARUTANI SHINJI (18)· patent assignee history
2014–2018Patents assigned to ENOMOTO YUICHIRO (12)· patent assignee history
2014–2018Patents assigned to KAMIMURA SOU (10)· patent assignee history
2014–2018Patents assigned to IWATO KAORU (8)· patent assignee history
2014–2017Based in Haibara-gun, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIFILM CORP | 30 | 2007–2018 |
| TARUTANI SHINJIself | 18 | 2012–2018 |
| ENOMOTO YUICHIRO | 12 | 2014–2018 |
| KAMIMURA SOU | 10 | 2014–2018 |
| IWATO KAORU | 8 | 2014–2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shizuoka, JP | 24 | 2007–2018 |
| Haibara-gun, JP | 6 | 2014–2017 |
| Saitama, JP | 2 | 1996–1997 |
| Tokyo, JP | 1 | 2004 |