Inventor
Seiji Samukawa
Inventor
Miyagi, JP
Overview
Patents· 37 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps36%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H05HPlasma technique11%
H01LSemiconductor devices7%
C23CCoating metallic material5%
B82YSpecific uses or applications of nanostructures3%
C23FNon-mechanical removal of metallic material from surface3%
H10BElectronic memory devices3%
H10NElectric solid-state devices not otherwise provided for3%
G01NInvestigating or analysing materials by determining their chemical or physical properties1%
PatentTitleYear
9,620,338'System, method, and program for predicting processing shape by plasma process'20179,412,567'Plasma monitoring method and plasma monitoring system'20169,096,937'Method for etching film having transition metal'20159,005,461'Plasma monitoring method and plasma monitoring system'20158,828,886'Low dielectric constant insulating film and method for forming the same'20148,427,168'Plasma monitoring method'20137,923,268'Method of measuring resistivity of sidewall of contact hole'20117,808,026'Dry etching method and production method of magnetic memory device'20107,732,783'Ultraviolet light monitoring system'20107,520,956'On-wafer monitoring system'20097,473,646'Dry etching method and production method of magnetic memory device'20097,314,574'Etching method and apparatus'20087,184,134'Real-time monitoring apparatus for plasma process'20077,144,520'Etching method and apparatus'20067,078,862'Beam source and beam processing apparatus'20067,034,285'Beam source and beam processing apparatus'20067,000,565'Plasma surface treatment system and plasma surface treatment method'20066,909,086'Neutral particle beam processing apparatus'20056,909,087'Method of processing a surface of a workpiece'20056,861,642'Neutral particle beam processing apparatus'20056,861,643'Neutral particle beam processing apparatus'20056,858,838'Neutral particle beam processing apparatus'20056,849,857'Beam processing apparatus'20056,348,158'Plasma processing with energy supplied'20026,177,147'Process and apparatus for treating a substrate'20016,054,063'Method for plasma treatment and apparatus for plasma treatment'20006,043,608'Plasma processing apparatus'20005,936,352'Plasma processing apparatus for producing plasma at low electron temperatures'19995,900,699'Plasma generator with a shield interposing the antenna'19995,827,435'Plasma processing method and equipment used therefor'19985,818,040'Neutral particle beam irradiation apparatus'19985,744,796'Mass spectrometer and radical measuring method'19985,565,738'Plasma processing apparatus which uses a uniquely shaped antenna to reduce the overall size of the apparatus with respect to the plasma chamber'19965,468,341'Plasma-etching method and apparatus therefor'19955,401,351'Radio frequency electron cyclotron resonance plasma etching apparatus'19955,366,586'Plasma formation using electron cyclotron resonance and method for processing substrate by using the same'19945,013,401'Microwave plasma etching method and apparatus'1991Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1991–2002Patents assigned to NEC CORP (14)· patent assignee history
1991–2000Patents assigned to ANELVA CORP (5)· patent assignee history
1991–2002Based in Tokyo, JP· patent location history
2005–2008Patents assigned to EBARA CORP (6)· patent assignee history
2005–2017Based in Miyagi, JP· patent location history
2006–2016Patents assigned to UNIV TOHOKU (6)· patent assignee history
2006–2014Based in Sendai, JP· patent location history
2013–2017Patents assigned to SAMUKAWA SEIJI (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NEC CORP | 14 | 1991–2002 |
| EBARA CORP | 6 | 2005–2008 |
| UNIV TOHOKU | 6 | 2006–2016 |
| ANELVA CORP | 5 | 1991–2000 |
| SAMUKAWA SEIJIself | 4 | 2013–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Miyagi, JP | 15 | 2005–2017 |
| Tokyo, JP | 14 | 1991–2002 |
| Sendai, JP | 8 | 2006–2014 |