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Inventor

Jun Abe

Inventor
Kanagawa, JP

Overview

65→
Patents
1993–2021
Patent span
Physics
Primary field (CPC G)

Patents· 65 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Gprimary
G03GElectrography11%
H01JElectric discharge tubes or discharge lamps7%
C03BManufacture, shaping, or supplementary processes6%
G01KMeasuring temperature6%
G02BOptical elements, systems or apparatus6%
C03CChemical composition of glasses, glazes or vitreous enamels5%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light5%
B60SServicing, cleaning, repairing, supporting, lifting, or manoeuvring of vehicles, not otherwise provided for5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
H01LSemiconductor devices4%
PatentTitleYear
11,021,810Lithium tantalate single crystal substrate, bonded substrate, manufacturing method of the bonded substrate, and surface acoustic wave device using the bonded substrate202110,707,829Lithium tantalate single crystal substrate for a surface acoustic wave device and a device using the same, and a manufacturing method thereof and an inspection method thereof202010,634,786Distance measuring device, distance measuring method, and program therefor202010,418,543Method of manufacturing an oxide single crystal substrate for a surface acoustic wave device201910,388,544Substrate processing apparatus and substrate processing method201910,370,687Genetically modified strain of eukaryotic microalga having improved triglyceride productivity, and use thereof20199,895,331'Prophylactic and/or therapeutic agent for radiation damage'20189,564,287'Substrate processing apparatus and substrate processing method using same'20179,554,172'Rebroadcasting system'20179,500,537'Temperature measurement apparatus and method'20169,493,139'Wiper apparatus'20169,454,104'Developing device and image forming apparatus'20169,417,582'Image forming apparatus including a controller that controls superposition of a correction toner image'20169,383,683'Transport mechanism, developing device, and image forming apparatus'20169,304,050'Temperature measurement apparatus and method'20169,213,269'Developing device and image forming apparatus'20159,121,698'Electronic level device and level staff used for electronic level device'20159,118,382'Relay apparatus for broadcast waves'20158,986,494'Plasma processing apparatus and temperature measuring method and apparatus used therein'20158,959,703'Wiper blade'20158,948,662'Two-component developer, developing device, and image forming apparatus'20158,892,009'Developing device, image forming apparatus and image forming method'20148,862,005'Image forming apparatus'20148,852,387'Plasma processing apparatus and shower head'20148,852,386'Plasma processing apparatus'20148,821,684'Substrate plasma processing apparatus and plasma processing method'20148,764,288'Temperature measuring apparatus and temperature measuring method'20148,745,811'Connection member in wiper blade'20148,747,609'Plasma processing apparatus and shower head'20148,708,386'Assist grip for vehicle'20148,703,002'Plasma processing apparatus, plasma processing method and storage medium'20148,676,097'Developing device, assembly, and image forming apparatus with a biasing member'20148,660,470'Developing device and image forming apparatus including the same'20148,641,117'Assist grip for vehicle'20148,585,284'Temperature measurement apparatus and method'20138,568,606'Substrate processing apparatus and substrate processing method using same'20138,331,832'Developing device, assembly body, and image forming apparatus'20128,182,142'Temperature measuring apparatus and temperature measuring method'20128,151,406'Wiper blade'20128,144,332'Temperature measurement apparatus and method'20127,952,717'Temperature measuring apparatus and temperature measuring method'20117,752,869'Optical fiber preform, method for manufacturing thereof, and optical fiber obtained by drawing thereof'2010D0571705'Windshield wiper'2008D0568801'Windshield wiper'20087,276,150'Method of desulfurizing gas oil fraction, desulfurized gas oil, and desulfurizer for gas oil fraction'20076,701,752'Synthesized silica glass optical member and method for manufacturing the same'20046,681,074'Method for producing base material for optical fiber having deformed first clad, base material for optical fiber and optical fiber'20046,600,857'Grating optical fiber, and optical fiber base material suitable for grating'20036,564,585'Method for producing a second-order nonlinear glass material'20036,497,992'Process for manufacturing semiconductor integrated circuit device'20026,380,109'Second-order nonlinear glass material'20026,308,372'Mounting structure of wiper apparatus'20016,301,412'Apparatus and method for making multi-branching optical coupler'20016,157,758'Grating optical fiber, and optical fiber base material suitable for grating'20006,057,081'Process for manufacturing semiconductor integrated circuit device'20005,887,233'Photographic developing apparatus and electrifying apparatus'19995,712,941'Rare earth element-doped multiple-core optical fiber and method for fabricating the same'19985,706,124'Rare earth element-doped optical fiber amplifier'19985,671,309'Wide-band optical fiber coupler and method for preparing the same'19975,541,736'Color image forming system which conducts charging exposure and development with respect to a photosensitive medium at a plurality of times'19965,513,038'Antireflective film and optical elements having the same'19965,463,452'Single-component developing apparatus'19955,286,623'Method for screening for Kawasaki disease'19945,247,333'One-component developing apparatus'19935,179,760'Apparatus for changing wiping range of wiper'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–2016Patents assigned to FUJI XEROX CO LTD (14)· patent assignee history
1993–2016Based in Kanagawa, JP· patent location history
1997–2021Patents assigned to SHINETSU CHEMICAL CO (14)· patent assignee history
2000–2021Based in Annaka, JP· patent location history
2001–2016Patents assigned to MITSUBA CORP (7)· patent assignee history
2011–2019Patents assigned to TOKYO ELECTRON LTD (16)· patent assignee history
2011–2019Based in Tokyo, JP· patent location history
2012–2016Patents assigned to ABE JUN (20)· patent assignee history
2012–2015Based in Nirasaki, JP· patent location history
2014–2019Based in Yamanashi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ABE JUNself202012–2016
TOKYO ELECTRON LTD162011–2019
FUJI XEROX CO LTD141993–2016
SHINETSU CHEMICAL CO141997–2021
MITSUBA CORP72001–2016
Locations
LocationPatentsSpan
Kanagawa, JP111993–2016
Annaka, JP82000–2021
Nirasaki, JP82012–2015
Yamanashi, JP72014–2019
Tokyo, JP62011–2019