Inventor

Risyun Kin

Inventor

Nagoya, JP

Overview

2017

Patent span

Performing operations

Primary field (CPC B)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Dprimary

B01DSeparation25%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry25%

B28DWorking stone or stone-like materials25%

F01NGas-flow silencers or exhaust apparatus for machines or engines in general25%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2017Patents assigned to NGK INSULATORS LTD (1)· patent assignee history

2017Based in Nagoya, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
NGK INSULATORS LTD	1	2017

Locations

Location	Patents	Span
Nagoya, JP	1	2017