Inventor
Takeshi Iizumi
Inventor
Tokyo, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C25Fprimary
C25FProcesses for the electrolytic removal of materials from objects23%
B24BMachines, devices, or processes for grinding or polishing15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
B08BCleaning in general8%
C01BNon-metallic elements8%
C11DDetergent compositions8%
G01BMeasuring length, thickness or similar linear dimensions8%
H01LSemiconductor devices8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
PatentTitleYear
10,500,691Substrate processing apparatus and substrate processing method20198,951,813'Method of polishing a substrate having a film on a surface of the substrate for semiconductor manufacturing'20157,638,030'Electrolytic processing apparatus and electrolytic processing method'20097,578,920'Electrolytic processing method'20097,476,303'Electrolytic processing apparatus and electrolytic processing method'2009Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009–2019Patents assigned to EBARA CORP (5)· patent assignee history
2009–2019Based in Tokyo, JP· patent location history
2009Based in Saitama-shi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EBARA CORP | 5 | 2009–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 4 | 2009–2019 |
| Saitama-shi, JP | 1 | 2009 |