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Inventor

Shih-Che Wang

Inventor
Hsinchu, TW

Overview

12→
Patents
2000–2021
Patent span
Physics
Primary field (CPC G)

Patents· 12 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%
B67DDispensing, delivering or transferring liquids, not otherwise provided for7%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them7%
H01LSemiconductor devices7%
LOC277%
Y10TTechnical subjects covered by former us classification7%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G06TImage data processing or generation, in general3%
PatentTitleYear
D0919880Electronic cigarette2021D0913578Electronic cigarette202110,795,270Methods of defect inspection202010,558,120System and method for supplying and dispensing bubble-free photolithography chemical solutions202010,274,818Lithography patterning with sub-resolution assistant patterns and off-axis illumination20199,817,315'System and method for supplying and dispensing bubble-free photolithography chemical solutions'20179,280,041'Cross quadrupole double lithography method using two complementary apertures'20168,416,393'Cross quadrupole double lithography method and apparatus for semiconductor device fabrication using two apertures'20137,838,173'Structure design and fabrication on photomask for contact hole manufacturing process window enhancement'20107,338,909'Micro-etching method to replicate alignment marks for semiconductor wafer photolithography'20086,420,791'Alignment mark design'20026,080,659'Method to form an alignment mark'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2002Patents assigned to UNITED MICROELECTRONICS CORP (2)· patent assignee history
2000–2020Based in Hsinchu, TW· patent location history
2008–2016Patents assigned to TAIWAN SEMICONDUCTOR MFG (4)· patent assignee history
2013Patents assigned to HSIEH HUNG CHANG (1)· patent assignee history
2017–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (4)· patent assignee history
2021Patents assigned to SHENZHEN RELX TECH CO LTD (2)· patent assignee history
2021Based in Shenzhen, CN· patent location history
2021Based in Beijing, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG42008–2016
TAIWAN SEMICONDUCTOR MFG CO LTD42017–2020
SHENZHEN RELX TECH CO LTD22021
UNITED MICROELECTRONICS CORP22000–2002
HSIEH HUNG CHANG12013
Locations
LocationPatentsSpan
Hsinchu, TW102000–2020
Shenzhen, CN12021
Beijing, CN12021