Inventor
Masahiko Minemura
Inventor
Annaka, JP
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds15%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
C08LCompositions of macromolecular compounds10%
C10MLubricating compositions5%
C10NIndexing scheme associated with subclass c10m relating to lubricating compositions5%
Y10TTechnical subjects covered by former us classification5%
B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for4%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients4%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
G02BOptical elements, systems or apparatus4%
PatentTitleYear
9,508,559'Semiconductor wafer and method for manufacturing semiconductor device'20169,163,157'Acrylic resin composition and moldings in which said composition is used'20159,163,121'Polycarbonate and polysiloxane block copolymer and flame retardant resin composition'20158,710,157'Contact lens material'20148,501,878'Method for producing polycarbonate material having excellent solubility and affinity, and contact lens material comprising the same'20138,394,183'Asymmetric membrane and air-conditioning system using the same'20138,394,181'Selectively permeable material, method for producing selectively permeable membrane structure, selectively permeable membrane structure, and air conditioning system'20138,365,105'Method of performing optical proximity effect corrections to photomask pattern'20138,298,732'Exposure method and method of making a semiconductor device'20128,288,493'(meth)acrylic-modified siloxane compounds'20128,173,720'Transparent gel and contact lense from the same'20128,080,627'Polycarbonate resin, process for producing the same and electrophotographic photoreceptor using the same'20117,631,288'Optical proximity correction performed with respect to limited area'20097,342,049'Dilatant fluid composition'20087,303,845'Method and system for efficiently verifying optical proximity correction'20077,039,889'Apparatus, method, and program for designing a mask and method for fabricating semiconductor devices'20066,942,820'Dimethylpolysiloxane composition'20056,878,200'Mortar or concrete composition'20056,635,392'Data processing apparatus, method and program product for compensating for photo proximity effect with reduced data amount, and photomask fabricated using same'20036,507,944'Data processing method and apparatus, reticle mask, exposing method and apparatus, and recording medium'20036,444,596'Air bag and base cloth therefor'20026,444,483'Method and apparatus of producing partial-area mask data files'20025,981,641'Heat conductive silicone composition, heat conductive material and heat conductive silicone grease'19995,945,185'Air bag made of silicone modified thermoplastic polyurethane resin'19995,557,000'Silicone oil for low temperature use'19965,489,482'Film forming composition'19965,391,314'Electroviscous fluid composition comprising a silicone oil, synthetic fluorinated oil and an addition polymer'19955,192,458'Silicone grease composition including an organomolybdenum compound'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–2015Patents assigned to SHINETSU CHEMICAL CO (17)· patent assignee history
1993–2015Based in Annaka, JP· patent location history
1995–2015Based in Gunma, JP· patent location history
1996–2005Based in Usui-gun, JP· patent location history
2002–2007Patents assigned to FUJITSU LTD (5)· patent assignee history
2002–2016Based in Kawasaki, JP· patent location history
2011–2014Patents assigned to MINEMURA MASAHIKO (9)· patent assignee history
2011–2015Patents assigned to MITSUBISHI GAS CHEMICAL CO (5)· patent assignee history
2012–2014Patents assigned to HAGIWARA MAMORU (4)· patent assignee history
2012–2013Based in Yokohama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 17 | 1993–2015 |
| MINEMURA MASAHIKOself | 9 | 2011–2014 |
| FUJITSU LTD | 5 | 2002–2007 |
| MITSUBISHI GAS CHEMICAL CO | 5 | 2011–2015 |
| HAGIWARA MAMORU | 4 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Annaka, JP | 8 | 1993–2015 |
| Kawasaki, JP | 7 | 2002–2016 |
| Gunma, JP | 6 | 1995–2015 |
| Usui-gun, JP | 3 | 1996–2005 |
| Yokohama, JP | 2 | 2012–2013 |