Inventor
John M. Algots
Inventor
San Diego, CA, US
Overview
Patents· 32 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Sprimary
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light31%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%
H05GX-ray technique14%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light7%
G02BOptical elements, systems or apparatus5%
G21KHandling of particles or ionising radiation not otherwise provided for4%
B82YSpecific uses or applications of nanostructures3%
F16CShafts3%
Y10TTechnical subjects covered by former us classification3%
H01FMagnets1%
PatentTitleYear
10,426,020Droplet generator steering system20199,544,983'Apparatus for and method of supplying target material'20179,279,445'Droplet generator steering system'20169,147,995'Rapidly tunable laser source assembly with long stroke grating mover'2015RE045249'System method and apparatus for selecting and controlling light source bandwidth'20148,855,166'6 KHz and above gas discharge laser system'20148,144,739'System method and apparatus for selecting and controlling light source bandwidth'20128,126,027'Line narrowing module'20127,838,854'Method and apparatus for EUV plasma source target delivery'20107,589,337'LPP EUV plasma source material target delivery system'20097,405,416'Method and apparatus for EUV plasma source target delivery'20087,382,815'Laser spectral engineering for lithographic process'20087,372,056'LPP EUV plasma source material target delivery system'20087,366,219'Line narrowing module'20087,346,093'DUV light source optical element improvements'20087,298,770'Laser spectral engineering for lithographic process'20077,217,940'Collector for EUV light source'20077,139,301'Laser spectral engineering for lithographic process'20067,122,816'Method and apparatus for EUV light source target material handling'20067,087,914'High repetition rate laser produced plasma EUV light source'20067,079,556'Bandwidth control technique for a laser'20066,904,073'High power deep ultraviolet laser with long life optics'20056,882,674'Four KHz gas discharge laser system'20056,853,653'Laser spectral engineering for lithographic process'20056,757,316'Four KHz gas discharge laser'20046,721,340'Bandwidth control technique for a laser'20046,671,294'Laser spectral engineering for lithographic process'20036,650,666'Laser wavelength control unit with piezoelectric driver'20036,532,247'Laser wavelength control unit with piezoelectric driver'20036,529,531'Fast wavelength correction technique for a laser'20036,496,528'Line narrowing unit with flexural grating mount'20026,192,064'Narrow band laser with fine wavelength control'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2012Patents assigned to CYMER INC (26)· patent assignee history
2001–2019Based in San Diego, CA, US· patent location history
2012–2016Patents assigned to ALGOTS J MARTIN (3)· patent assignee history
2012Patents assigned to PARTLO WILLIAM N (2)· patent assignee history
2014Patents assigned to Cymer LLC (2)· patent assignee history
2016–2019Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CYMER INC | 26 | 2001–2012 |
| ALGOTS J MARTINself | 3 | 2012–2016 |
| ASML NETHERLANDS BV | 3 | 2016–2019 |
| Cymer LLC | 2 | 2014 |
| PARTLO WILLIAM N | 2 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Diego, California, US | 32 | 2001–2019 |