Inventor
Kiyoyuki Ookubo
Inventor
Iwaki, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C22Cprimary
C22CAlloys19%
C23CCoating metallic material19%
H01JElectric discharge tubes or discharge lamps19%
B22DCasting of metals13%
C22FChanging the physical structure of non-ferrous metals and non-ferrous alloys13%
C01GCompounds containing metals not covered by subclasses c01d or c01f6%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds6%
G11BInformation storage based on relative movement between record carrier and transducer6%
PatentTitleYear
10,770,274Copper alloy sputtering target and manufacturing method of copper alloy sputtering target202010,062,552Copper alloy sputtering target and manufacturing method of copper alloy sputtering target20189,518,320'Copper alloy sputtering target'20165,543,070'Magnetic recording powder having low curie temperature and high saturation magnetization'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2020Patents assigned to MITSUBISHI MATERIALS CORP (4)· patent assignee history
1996Based in Kitamoto, JP· patent location history
2016–2020Based in Iwaki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI MATERIALS CORP | 4 | 1996–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Iwaki, JP | 3 | 2016–2020 |
| Kitamoto, JP | 1 | 1996 |