Inventor
Cody Collins Ransom
Inventor
Hopewell Junction, NY, US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
H10DInorganic electric semiconductor devices20%
A47LDomestic washing or cleaning10%
B08BCleaning in general10%
C11DDetergent compositions10%
C23CCoating metallic material10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
PatentTitleYear
11,014,128Cleaning system and methods20216,475,893'Method for improved fabrication of salicide structures'20026,388,327'Capping layer for improved silicide formation in narrow semiconductor structures'20025,242,859'Highly doped semiconductor material and method of fabrication thereof'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–2002Patents assigned to IBM (3)· patent assignee history
1993–2002Based in Hopewell Junction, NY, US· patent location history
2021Patents assigned to RANSOM CODY COLLINS (1)· patent assignee history
2021Based in Layton, UT, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 3 | 1993–2002 |
| RANSOM CODY COLLINSself | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hopewell Junction, New York, US | 3 | 1993–2002 |
| Layton, UT, US | 1 | 2021 |