Inventor

KUAN-TING PAN

Inventor

TW

Overview

2021–2026

Patent span

Electricity

Primary field (CPC H)

Patents· 81 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary

H10DInorganic electric semiconductor devices33%

H01LSemiconductor devices28%

B82YSpecific uses or applications of nanostructures18%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%

H10BElectronic memory devices1%

PatentTitleYear

12,593,475Field effect transistor with isolation structure and method2026 12,581,704Semiconductor device structure and method for forming the same2026 12,563,816Method for forming sidewall spacers disposed above mask layer and semiconductor devices fabricated thereof2026 12,557,317Semiconductor devices with fin-top hard mask and methods for fabrication thereof2026 12,520,518Semiconductor device structure and methods of forming the same2026 12,477,802Structure of isolation feature of semiconductor device structure2025 12,471,316Semiconductor device and manufacturing method thereof2025 12,464,814Method of manufacturing semiconductor devices and semiconductor devices2025 12,457,798Dielectric liner for field effect transistors2025 12,453,127Methods of manufacturing semiconductor devices and semiconductor devices2025 12,439,680Multi-gate device and related methods2025 12,419,094Semiconductor device with trimmed channel region and method of making the same2025 12,396,246Semiconductor integrated circuit including gate-all-around FETs with nanosheet channels and Fin-like FETs2025 12,376,366Semiconductor device and method of manufacturing the same2025 12,376,354Semiconductor and method for manufacturing the same2025 12,369,366Convergent fin and nanostructure transistor structure and method2025 12,349,407Method for manufacturing semiconductor structure with dielectric feature2025 12,349,456Semiconductor device structure and methods of forming the same2025 12,349,378Semiconductor devices with Fin-top hard mask and methods for fabrication thereof2025 12,324,225Self-aligned structure for semiconductor devices2025 12,322,653Self-aligned metal gate for multigate device and method of forming thereof2025 12,317,528Gate isolation feature and manufacturing method thereof2025 12,300,732Gate all around transistor with dual inner spacers2025 12,272,690Gate isolation for multigate device2025 12,237,405Semiconductor devices and methods of manufacturing thereof2025 12,199,097Seam free isolation structures and method for making the same2025 12,165,926FinFET device structure having dielectric features between a plurality of gate electrodes and methods of forming the same2024 12,148,815Fin field effect transistor device structure2024 12,142,692Semiconductor device with isolation structure2024 12,107,006Method for manufacturing semiconductor structure with dielectric feature2024 12,107,153Semiconductor device and manufacturing method thereof2024 12,100,770Field effect transistor with gate isolation structure and method2024 12,087,636Semiconductor device including a FinFET structure and method for fabricating the same2024 12,087,768Semiconductor device structure and method for forming the same2024 12,080,776Field effect transistor with fin isolation structure and method2024 12,074,164FinFET pitch scaling2024 12,068,320Gate isolation for multigate device2024 12,057,507Method for manufacturing semiconductor device structure2024 12,051,693Method for manufacturing semiconductor structure with isolation strips2024 12,034,062Semiconductor device structure and method for forming the same2024 12,021,136Gate isolation feature and manufacturing method thereof2024 12,014,960Etch profile control of polysilicon structures of semiconductor devices2024 11,996,332Semiconductor device and method of manufacturing the same2024 11,990,374Method for forming sidewall spacers and semiconductor devices fabricated thereof2024 11,990,471Gate isolation for multigate device2024 11,961,763Self-aligned metal gate for multigate device and method of forming thereof2024 11,948,973Gate-all-around field-effect transistor device2024 11,929,287Dielectric liner for field effect transistors2024 11,916,122Gate all around transistor with dual inner spacers2024 11,854,908Multi-gate device and related methods2023 11,837,504Self-aligned structure for semiconductor devices2023 11,799,019Gate isolation feature and manufacturing method thereof2023 11,757,021Semiconductor devices with fin-top hard mask and methods for fabrication thereof2023 11,742,428Formation method of semiconductor device with isolation structure2023 11,735,591Semiconductor devices with dielectric fins and method for forming the same2023 11,735,649Method for forming fin field effect transistor (FinFET) with a liner layer2023 11,735,482Semiconductor device structure and methods of forming the same2023 11,688,809Semiconductor device structure2023 11,676,864Semiconductor device structure and methods of forming the same2023 11,637,102Gate isolation for multigate device2023 11,626,402Semiconductor device structure2023 11,626,509Semiconductor device and manufacturing method thereof2023 11,621,195Semiconductor device and method of manufacturing the same2023 11,616,062Gate isolation for multigate device2023 11,581,437Semiconductor device structure and methods of forming the same2023 11,569,234Semiconductor device structure and methods of forming the same2023 11,563,106Formation method of isolation feature of semiconductor device structure2023 11,532,725Method for forming sidewall spacers and semiconductor devices fabricated thereof2022 11,532,732Multi-gate device and method of fabrication thereof2022 11,527,533FinFET pitch scaling2022 11,502,187Semiconductor device structure and method for forming the same2022 11,495,677Semiconductor devices and methods of manufacturing thereof2022 11,456,368Semiconductor device structure with hard mask layer over fin structure and method for forming the same2022 11,355,398Semiconductor device structure and methods of forming the same2022 11,355,396Method of forming a semiconductor structure including laterally etching semiconductor material in fin recess region and depositing metal gate therein2022 11,349,016Fin field effect transistor (FinFET) with a liner layer2022 11,329,165Structure and formation method of semiconductor device with isolation structure2022 11,328,963Multi-gate device and related methods2022 11,302,580Nanosheet thickness2022 11,211,381Semiconductor device structure and method for forming the same2021 11,164,866Semiconductor structure and method for manufacturing the same2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (81)· patent assignee history

2021–2026Based in TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TAIWAN SEMICONDUCTOR MFG CO LTD	81	2021–2026

Locations

Location	Patents	Span
TW	81	2021–2026