Inventor
Horst Binder
Inventor
Lampertheim, DE
Overview
Patents· 40 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests15%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds13%
C09DCoating compositions, e.g. paints, varnishes or lacquers9%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%
G03CPhotosensitive materials for photographic purposes5%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients4%
B05DProcesses for applying fluent materials to surfaces, in general2%
C07CAcyclic or carbocyclic compounds2%
C07DHeterocyclic compounds2%
PatentTitleYear
10,358,576Two-component coating compounds20199,617,402'Process for preparing polyisocyanates which are flocculation-stable in solvents from (cyclo)aliphatic diisocyanates'20179,279,030'Isocyanate-containing formulations'20168,969,614'Method for producing colourless polyisocyanates'20158,609,887'Process for preparing polyisocyanates comprising biuret groups'20138,445,622'Process for preparing polyisocyanates'20138,373,004'Method for producing colorless isocyanurates of diisocyanates'20138,119,799'Method for the production of polyisocyanates comprising isocyanurate groups and use therof'20127,888,424'Method for producing a curable aqueous polymer dispersion'20116,780,897'Solid substance mixture containing bonds that can be activated by actinic radiation and the use thereof'20046,774,198'Partially branched polymers'20046,696,505'Preparation of polyurethane foams'20046,485,793'Aqueous dispersion of transparent powder coating material'20025,914,219'Radiation-sensitive mixture and the production of relief structures having improved contrast'19995,846,689'Positive-working radiation-sensitive mixture and production of relief structures'19985,783,354'Positive-working radiation-sensitive mixture'19985,759,750'Radiation-sensitive mixture'19985,690,762'Emergency ring for a vehicle wheel'19975,563,022'Positive-working radiation-sensitive mixture and the production of relief patterns'1996RE035217'Aqueous developer solution having hydroxy-alkyl piperidine for positive-working photoresists'19965,318,876'Radiation-sensitive mixture containing acid-labile groups and production of relief patterns'19945,300,400'Process for the production of relief patterns and images utilizing an organic compound having at least one acid-cleavable group and a storage stability improving amount of a second organic compound'19945,252,436'Process for developing a positive-working photoresist containing poly(p-hydroxystyrene) and sulfonium salt with an aqueous developer containing basic organic compounds'19935,118,585'Positive and negative working radiation sensitive mixtures and production of relief patterns'19925,084,371'Positive-working, radiation-sensitive mixture based on acid-cleavable and photochemically acid-forming compounds, and the production of relief patterns and relief images'19925,075,199'Radiation sensitive mixture and production of relief patterns'19915,073,474'Radiation-sensitive mixture containing acid labile groups and production of relief patterns'19915,069,997'Positive and negative working radiation sensitive mixtures and production of relief patterns'19915,069,998'Radiation sensitive mixture and production of relief patterns'19915,039,595'Aqueous developer solution having hydroxy-alkyl piperidine for positive-working photoresists'19915,034,305'Radiation-sensitive mixture'19914,913,949'Planar, multilayered, laser-optical recording material'19904,883,740'Radiation-sensitive mixture for photosensitive coating materials'19894,822,866'Copolymers having O-nitrocarbinol ester groups and production of semiconductor components'19894,812,542'Copolymers having o-nitrocarbinol ester groups and preparation thereof'19894,808,682'Copolymers having o-nitrocarbinol ester groups, production of two-layer resists, and fabrication of semiconductor components'19894,757,098'Stabilized solutions of radiation-crosslinkable polymer precursors of highly heat-resistant polymers'19884,108,620'Device for the separation of gaseous mixtures into components of different molecular mass'19784,036,724'Device for the continuous determination of carbon monoxide content of air'19774,029,563'Electrochemical measuring cell'1977Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1977–1978Based in Karben-Petterweil, DE· patent location history
1988–2019Based in Lampertheim, DE· patent location history
1989–2016Patents assigned to BASF AG (26)· patent assignee history
1997Based in Munich, DE· patent location history
1999Based in Lamppertheim, DE· patent location history
2012–2016Patents assigned to BINDER HORST (6)· patent assignee history
2013–2019Patents assigned to BASF SE (6)· patent assignee history
2013–2015Patents assigned to BAYER ALEXANDER (3)· patent assignee history
2013–2015Patents assigned to KRONER MATTHIAS (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| BASF AG | 26 | 1989–2016 |
| BASF SE | 6 | 2013–2019 |
| BINDER HORSTself | 6 | 2012–2016 |
| BAYER ALEXANDER | 3 | 2013–2015 |
| KRONER MATTHIAS | 3 | 2013–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Lampertheim, DE | 35 | 1988–2019 |
| Karben-Petterweil, DE | 3 | 1977–1978 |
| Lamppertheim, DE | 1 | 1999 |
| Munich, DE | 1 | 1997 |