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Inventor

Shin-Chih Liaw

Inventor
Hsinchu, TW

Overview

4→
Patents
2011–2013
Patent span
Chemistry
Primary field (CPC C)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material25%
B08BCleaning in general13%
C02FTreatment of water, waste water, sewage, or sludge13%
C22BProduction and refining of metals13%
C23FNon-mechanical removal of metallic material from surface13%
H05KPrinted circuits13%
Y02PClimate change mitigation technologies in the production or processing of goods13%
PatentTitleYear
8,464,734'Apparatus for wet processing substrate'20138,281,741'Plasma deposition apparatus and deposition method utilizing same'20128,062,580'Apparatus for recycling metal from metal ions containing waste solution'20117,923,076'Plasma deposition apparatus and deposition method utilizing same'2011

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011–2013Patents assigned to LIAW SHIN-CHIH (3)· patent assignee history
2011–2013Patents assigned to CHEN WEN-TSUN (2)· patent assignee history
2011–2012Patents assigned to IND TECH RES INST (2)· patent assignee history
2011–2013Patents assigned to LIAO TAO-MING (2)· patent assignee history
2011–2013Patents assigned to SHEN CHIA-HUNG (2)· patent assignee history
2011–2012Based in Hsinchu, TW· patent location history
2011Based in Taoyuan, TW· patent location history
2013Based in Tayuan, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
LIAW SHIN-CHIHself32011–2013
CHEN WEN-TSUN22011–2013
IND TECH RES INST22011–2012
LIAO TAO-MING22011–2013
SHEN CHIA-HUNG22011–2013
Locations
LocationPatentsSpan
Hsinchu, TW22011–2012
Tayuan, TW12013
Taoyuan, TW12011