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Inventor

Masaya Komatsu

Inventor
Tokyo, JP

Overview

5→
Patents
1996–2003
Patent span
Physics
Primary field (CPC G)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
6,610,460'Exposure method'20035,739,898'Exposure method and apparatus'19985,682,226'Photomask, an exposure method and a projection exposure apparatus'19975,592,259'Photomask, an exposure method and a projection exposure apparatus'19975,508,132'Photo mask'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–2003Patents assigned to NIKON CORP (5)· patent assignee history
1996–1997Based in Tokyo, JP· patent location history
1998Based in Fukaya, JP· patent location history
2003Based in Ibaraki, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIKON CORP51996–2003
Locations
LocationPatentsSpan
Tokyo, JP31996–1997
Ibaraki, JP12003
Fukaya, JP11998