Inventor
SUNG-GI KIM
Inventor
KR
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds14%
C08JWorking-up9%
C08LCompositions of macromolecular compounds9%
C23CCoating metallic material9%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium8%
B29CShaping or joining of plastics6%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts6%
B29LIndexing scheme associated with subclass b29c, relating to particular articles5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
H01LSemiconductor devices5%
PatentTitleYear
12,593,628Silicon precursor having a heterocyclic group, composition for depositing a silicon-containing layer comprising the same and method of depositing a silicon-containing layer using the same202612,546,001Composition for depositing a silicon-containing layer and method of depositing a silicon-containing layer using the same202612,518,963Composition for depositing silicon-containing thin film and method for manufacturing silicon-containing thin film using the same202612,398,459Silicon metal oxide encapsulation film comprising metal or metal oxide in thin film, and manufacturing method therefor202512,392,057Polyester fiber, preparaion method thereof and molded article formed therefrom202512,304,924Silylcyclodisilazane compound and method for manufacturing silicon-containing thin film using the same202511,939,425Polyester resin202411,926,117MDO thermoresistant heat-shrinkable multilayer film202411,787,901Polyester container and manufacturing method therefor202311,749,522Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin using the same202311,713,373Polyester resin, method for preparing same, and resin molded product formed therefrom202311,560,457MDO thermoresistant heat-shrinkable film202311,492,444Polyester container and manufacturing method therefor202211,447,603Polyester resin, method for preparing same, and resin molded product formed therefrom202211,396,579Polyester film and manufacturing method thereof202211,390,714Polyarylene sulfide resin and preparation method thereof202211,393,676Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin film using the same202211,390,635Composition for depositing silicon-containing thin film and method for producing silicon-containing thin film using the same202211,370,915Polyarylene sulfide resin composition and formed article202211,358,974Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition202211,319,333Disilylamine compound, method for preparing the same, and composition for depositing silicon-containing thin film including the same202211,267,934Polyester resin composition and preparation method thereof202211,236,210Heat shrinkable film composition comprising polyethyleneterephtalate resin and polyester based copolymer, and heat shrinkable film202211,203,676Heat shrinkable film comprising polyester based copolymer2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to SK CHEMICALS CO LTD (14)· patent assignee history
2021–2026Based in KR· patent location history
2022–2026Patents assigned to DNF CO LTD (9)· patent assignee history
2022Patents assigned to HDC POLYALL CO LTD (2)· patent assignee history
2022Based in DE· patent location history
2026Patents assigned to SAMSUNG ELECTRONICS CO LTD (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SK CHEMICALS CO LTD | 14 | 2021–2025 |
| DNF CO LTD | 9 | 2022–2026 |
| HDC POLYALL CO LTD | 2 | 2022 |
| SAMSUNG ELECTRONICS CO LTD | 2 | 2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| KR | 23 | 2021–2026 |
| DE | 1 | 2022 |