Inventor
Yutaka Ohmoto
Inventor
Hikari, JP
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps36%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
E03CDomestic plumbing installations for fresh water or waste water7%
H01LSemiconductor devices7%
H05BElectric heating4%
H05HPlasma technique4%
C23CCoating metallic material2%
G01BMeasuring length, thickness or similar linear dimensions2%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
PatentTitleYear
10,796,890Plasma processing apparatus and sample stage thereof202010,141,165Plasma processing apparatus and sample stage thereof20189,384,946'Plasma processing apparatus'20169,150,967'Plasma processing apparatus and sample stage'20158,282,848'Plasma processing method and plasma processing apparatus'20128,092,637'Manufacturing method in plasma processing apparatus'20127,608,162'Plasma processing apparatus and method'20097,396,481'Etching method of organic insulating film'20087,288,166'Plasma processing apparatus'20077,122,479'Etching processing method'20067,026,252'Etching aftertreatment method'20067,014,787'Etching method of organic insulating film'20067,009,714'Method of dry etching a sample and dry etching system'20066,867,144'Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield'20056,793,833'Etching method of organic insulating film'20046,759,338'Plasma processing apparatus and method'20046,649,021'Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield'20036,413,876'Method for plasma processing high-speed semiconductor circuits with increased yield'20026,328,845'Plasma-processing method and an apparatus for carrying out the same'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2009Patents assigned to HITACHI LTD (10)· patent assignee history
2001–2020Based in Hikari, JP· patent location history
2006–2020Patents assigned to HITACHI HIGH TECH CORP (9)· patent assignee history
2012–2016Patents assigned to OHMOTO YUTAKA (4)· patent assignee history
2012–2015Patents assigned to YAKUSHIJI MAMORU (3)· patent assignee history
2012Patents assigned to KOUZUMA YUTAKA (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 10 | 2001–2009 |
| HITACHI HIGH TECH CORP | 9 | 2006–2020 |
| OHMOTO YUTAKAself | 4 | 2012–2016 |
| YAKUSHIJI MAMORU | 3 | 2012–2015 |
| KOUZUMA YUTAKA | 2 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hikari, JP | 19 | 2001–2020 |