Inventor
Toru Ushirogouchi
Inventor
Yokohama, JP
Overview
Patents· 52 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests23%
C09DCoating compositions, e.g. paints, varnishes or lacquers12%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds8%
B41JTypewriters5%
B41MPrinting, duplicating, marking, or copying processes4%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds3%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds3%
C09CTreatment of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties3%
C09BOrganic dyes or closely-related compounds for producing dyes, e.g. pigments2%
PatentTitleYear
8,486,182'Method and system for removing carbon dioxide from exhaust gas by utilizing seawater'20137,896,484'Ink jet recording apparatus'20117,858,670'Photosensitive inkjet ink'20107,803,851'Inkjet ink'20107,754,785'Pigment dispersion, precursor of ink for UV-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion'20107,579,390'Inkjet ink composition and printed matters created using inkjet ink composition'20097,500,745'Liquid ink and recording apparatus'20097,473,720'Photosensitive inkjet ink'20097,439,281'Pigment dispersion, precursor of ink for UV-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion'20087,425,525'Washing solution for inkjet printer head and washing method using the solution'20087,417,074'Ink for ink jet and ink jet recording apparatus'20087,387,380'Liquid ink and recording apparatus'20087,375,145'Inkjet ink'20087,285,581'Processed pigments, pigment-dispersed solution, ink for ink jet, manufacturing method of processed pigments and manufacturing method of pigment-dispersed solution'20077,163,781'Process for producing a semiconductor device'20077,125,112'Liquid ink and recording apparatus'20067,119,156'Resist resin'20067,108,367'Liquid ink and recording apparatus'20067,070,905'Pattern forming process'20067,063,932'Resist resin'20067,029,823'Resist composition'20066,974,658'HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS'20056,959,986'Liquid ink and recording apparatus'20056,824,957'Resin useful for resist, resist composition and pattern forming process using the same'20046,660,450'Resin useful for resist, resist composition and pattern forming process using the same'2003RE038256'Photosensitive composition'20036,541,597'Resin useful for resist, resist composition and pattern forming process using the same'20036,440,636'Polymeric compound and resin composition for photoresist'20026,410,748'Alicycli c group-containing monomer'20026,303,266'Resin useful for resist, resist composition and pattern forming process using the same'20016,291,129'Monomer, high molecular compound and photosensitive composition'20016,280,897'Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts'20016,228,552'Photo-sensitive material, method of forming a resist pattern and manufacturing an electronic parts using photo-sensitive material'20016,197,473'Photosensitive composition and a pattern forming process using the same'20016,190,841'Pattern forming process and a photosensitive composition'20016,177,229'Photosensitive composition'20016,168,897'Method of forming patterns'20016,071,670'Transparent resin, photosensitive composition, and method of forming a pattern'20006,060,207'Photosensitive material'20006,045,968'Photosensitive composition'20006,025,117'Method of forming a pattern using polysilane'20005,932,391'Resist for alkali development'19995,928,841'Method of photoetching at 180 to 220'19995,853,952'Color developing organic material, color developing resin composition and colored thin film pattern'19985,837,419'Photosensitive composition'19985,691,101'Photosensitive composition'19975,372,914'Pattern forming method'19945,348,838'Photosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl group'19945,169,740'Positive type and negative type ionization irradiation sensitive and/or deep U.V. sensitive resists comprising a halogenated resin binder'19925,091,282'Alkali soluble phenol polymer photosensitive composition'19924,988,601'Photosensitive resin composition with o-quinone diazide and novolac resins prepared from mixed phenolic reactants to include 3,5-xylenol and 2,5-xylenol'19914,871,646'Polysilane compound and photosensitive composition'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–2013Patents assigned to TOSHIBA KK (43)· patent assignee history
1989–2013Based in Yokohama, JP· patent location history
1999–2001Based in Kanagawa, JP· patent location history
2002Patents assigned to DAICEL CHEM (1)· patent assignee history
2007–2011Patents assigned to TOSHIBA TEC KK (13)· patent assignee history
2013Patents assigned to MAEZAWA YUKISHIGE (1)· patent assignee history
2013Patents assigned to SANO KENJI (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSHIBA KK | 43 | 1989–2013 |
| TOSHIBA TEC KK | 13 | 2007–2011 |
| DAICEL CHEM | 1 | 2002 |
| MAEZAWA YUKISHIGE | 1 | 2013 |
| SANO KENJI | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 49 | 1989–2013 |
| Kanagawa, JP | 3 | 1999–2001 |