Inventor
Alan D. Brodie
Inventor
Palo Alto, CA, US
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps49%
B82YSpecific uses or applications of nanostructures14%
G01NInvestigating or analysing materials by determining their chemical or physical properties12%
G21KHandling of particles or ionising radiation not otherwise provided for6%
B81BMicrostructural devices or systems, e.g. micromechanical devices4%
C23CCoating metallic material4%
G01RMeasuring electric variables4%
H01LSemiconductor devices2%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h102%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2%
PatentTitleYear
10,497,536Apparatus and method for correcting arrayed astigmatism in a multi-column scanning electron microscopy system201910,338,013Position feedback for multi-beam particle detector201910,242,839Reduced Coulomb interactions in a multi-beam column201910,072,334Digital pattern generator having charge drain coating20189,874,597Light-emitting device test systems20189,824,851'Charge drain coating for electron-optical MEMS'20179,715,995'Apparatus and methods for electron beam lithography using array cathode'20179,214,344'Pillar-supported array of micro electron lenses'20159,040,942'Electron beam lithography with linear column array and rotary stage'20158,957,394'Compact high-voltage electron gun'20158,642,981'Electron microscope assembly for viewing the wafer plane image of an electron beam lithography tool'20148,253,119'Well-based dynamic pattern generator'20128,063,365'Non-shot-noise-limited source for electron beam lithography or inspection'20117,855,362'Contamination pinning for auger analysis'20107,828,622'Sharpening metal carbide emitters'20107,615,747'Sampling feedback system'20097,405,402'Method and apparatus for aberration-insensitive electron beam imaging'20087,335,894'High current density particle beam system'20087,091,486'Method and apparatus for beam current fluctuation correction'20066,977,375'Multi-beam multi-column electron beam inspection system'20056,844,550'Multi-beam multi-column electron beam inspection system'20056,617,587'Electron optics for multi-beam electron beam lithography tool'20036,316,164'Proximity effect correction method through uniform removal of fraction of interior pixels'20015,717,204'Inspecting optical masks with electron beam microscopy'19985,665,968'Inspecting optical masks with electron beam microscopy'19975,578,821'Electron beam inspection system and method'19965,502,306'Electron beam inspection system and method'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–1998Patents assigned to KLA INSTR CORP (4)· patent assignee history
1996–2019Based in Palo Alto, CA, US· patent location history
2003–2005Patents assigned to MULTIBEAM SYSTEMS INC (3)· patent assignee history
2006–2010Patents assigned to KLA TENCOR TECH CORP (4)· patent assignee history
2009–2019Patents assigned to KLA TENCOR CORP (13)· patent assignee history
2012–2017Patents assigned to BRODIE ALAN D (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR CORP | 13 | 2009–2019 |
| KLA INSTR CORP | 4 | 1996–1998 |
| KLA TENCOR TECH CORP | 4 | 2006–2010 |
| BRODIE ALAN Dself | 3 | 2012–2017 |
| MULTIBEAM SYSTEMS INC | 3 | 2003–2005 |
Locations
| Location | Patents | Span |
|---|---|---|
| Palo Alto, California, US | 27 | 1996–2019 |