Inventor

I-Pien Wu

Inventor
Hsinchu, TW

Overview

6→
Patents
1977–2009
Patent span
Physics
Primary field (CPC G)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices44%
F28FDetails of heat-exchange and heat-transfer apparatus, of general application11%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution11%
Y02PClimate change mitigation technologies in the production or processing of goods11%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1977Patents assigned to SILICON MATERIAL INC (1)· patent assignee history
1977Based in Sunnyvale, CA, US· patent location history
2003–2009Patents assigned to MACRONIX INT CO LTD (4)· patent assignee history
2003Patents assigned to MACRONIX INTERNAT CO INC (1)· patent assignee history
2003–2009Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MACRONIX INT CO LTD42003–2009
MACRONIX INTERNAT CO INC12003
SILICON MATERIAL INC11977
Locations
LocationPatentsSpan
Hsinchu, TW52003–2009
Sunnyvale, California, US11977