Inventor
Seung-Won Cha
Inventor
Daejeon, KR
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices33%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation25%
H04NPictorial communication, e.g. television17%
G01CMeasuring distances, levels or bearings8%
G01SRadio direction-finding8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
PatentTitleYear
10,910,237Operating method for wet etching system and related system20219,673,237'Depth pixel included in three-dimensional image sensor, three-dimensional image sensor including the same and method of operating depth pixel included in three-dimensional image sensor'20179,380,242'Image sensor and devices having the same'20169,344,657'Depth pixel and image pick-up apparatus including the same'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2021Patents assigned to SAMSUNG ELECTRONICS CO LTD (4)· patent assignee history
2016–2017Based in Daejeon, KR· patent location history
2016Based in Seoul, KR· patent location history
2021Based in Hwaseong-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 4 | 2016–2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Daejeon, KR | 2 | 2016–2017 |
| Hwaseong-si, KR | 1 | 2021 |
| Seoul, KR | 1 | 2016 |