Inventor
ZHENGQUAN TAN
Inventor
US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties18%
G01BMeasuring length, thickness or similar linear dimensions12%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light12%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices12%
H01LSemiconductor devices12%
H10DInorganic electric semiconductor devices12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure6%
G06TImage data processing or generation, in general6%
PatentTitleYear
12,379,672Metrology of nanosheet surface roughness and profile202511,796,390Bandgap measurements of patterned film stacks using spectroscopic metrology202311,573,077Scatterometry based methods and systems for measurement of strain in semiconductor structures202311,555,689Measuring thin films on grating and bandgap on grating202311,378,451Bandgap measurements of patterned film stacks using spectroscopic metrology2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to KLA CORP (4)· patent assignee history
2022–2023Patents assigned to KLA TENCOR CORP (2)· patent assignee history
2022–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA CORP | 4 | 2022–2025 |
| KLA TENCOR CORP | 2 | 2022–2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 5 | 2022–2025 |